Indium-doped strontium titanate material and its preparation method
A strontium titanate and raw material technology, applied in the field of indium-doped strontium titanate materials, can solve the problems that no one has developed P-type SrTiO
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0032] Select the chemical formula (2), select x=0.2, and prepare a composite block with a thickness of Φ30mm and a thickness of about 4mm. In an air atmosphere, sinter at a temperature of 600-900°C for 15 hours. A total of 3 times of crushing and grinding-pressing molding-sintering, and finally sintering at a temperature of 1200°C for 48 hours. SrIn 0.2 Ti 0.8 o 3 blocks.
[0033] Choose this block as the target, choose 10mm×10mm×0.5mm SrTiO 3 As the substrate, use laser molecular beam epitaxy at a substrate temperature of 620°C and an oxygen pressure of 1×10 -4 Under the condition of Pa, SrIn with a film thickness of 5000 Å was prepared 0.2 Ti 0.8 o 3 film.
[0034] High-energy electron diffraction and X-ray diffraction prove that the P-type SrIn we prepared 0.2 Ti 0.8 o 3 The film is a c-oriented single crystal film with a very good epitaxial single crystal phase. The resistivity of the film measured by the standard four-probe method reaches 10 -4 Ω cm, P-type...
Embodiment 2
[0036] Make according to embodiment 1, select chemical formula (1) for use, choose x=0.005, prepare composite block material, before raw material is mixed, earlier SrCO 3 Decarbonize under oxygen atmosphere and 850°C for 20 hours to prepare block.
[0037] Select this block as a target to prepare SrIn with a film thickness of 2000 Å 0.005 Ti 0.995 o 3 film.
Embodiment 3
[0039] Manufactured according to Example 1, with pulsed laser deposition, under the conditions of substrate temperature 700 ° C and oxygen pressure 20 Pa, SrI with a film thickness of 4000 Å was prepared. 0.2 Ti 0.8 o 3 film.
PUM
Property | Measurement | Unit |
---|---|---|
Resistivity | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com