Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A kind of cerium-zirconium doped polishing liquid and its preparation method and application

A polishing liquid, cerium zirconium technology, applied in the polishing of blue glass, cerium zirconium doped polishing liquid and its preparation field, can solve the problems such as the inability to balance surface quality and removal amount, high hardness of cerium oxide, incapability of universal use, etc. Ball milling efficiency, small grain size, perfect lattice effect

Active Publication Date: 2022-03-29
DEMETER SUZHOU ELECTRONICS ENVIRONMENTAL MATERIALS CO LTD
View PDF9 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, the traditional polishing liquid used in the market is generally based on zirconia, which has the problems of scratches, frog skin, and low service life, and cannot be used universally; while cerium oxide polishing powder can meet the requirements for the low-end market with low requirements, but Manufacturers with high surface roughness requirements are still not good, the main reason is that cerium oxide itself is hard and easy to cause scratches; there are also some cerium-zirconium doped polishing fluids on the market, but the surface quality and removal amount still cannot be taken into account

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of cerium-zirconium doped polishing liquid and its preparation method and application
  • A kind of cerium-zirconium doped polishing liquid and its preparation method and application
  • A kind of cerium-zirconium doped polishing liquid and its preparation method and application

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0045]This embodiment provides a method for preparing a cerium-zirconium-doped polishing solution, using cerium carbonate and basic zirconium carbonate as precursors. The preparation method includes the following steps:

[0046] (1) Mix cerium carbonate, basic zirconium carbonate, and water in a ball mill, ball mill, and add sodium polyacrylate during the ball milling process, monitor the median particle size of the slurry particles, the median particle size D 50 = 1.5±0.2 μm to obtain ball mill slurry; wherein the ball mill adopts a high-energy ball mill, and the parameters of the high-energy ball mill are set as follows: the input energy form is grinding input energy, the input energy value is 70Hz, the diameter of the grinding beads is about 2mm, and the ball The ratio is 1:10, and the solid content of the control ball mill slurry is 45%. The mass ratio of cerium carbonate and basic zirconium carbonate is 2:8. In terms of mass percentage, the amount of ammonium salt of acryl...

Embodiment 2

[0052] This embodiment provides a method for preparing a cerium-zirconium-doped polishing solution, using basic cerium carbonate and basic zirconium carbonate as precursors, and the preparation method includes the following steps:

[0053] (1) Mix basic cerium carbonate, basic zirconium carbonate, and water in a ball mill, ball mill, and add sodium polyacrylate during the ball milling process, monitor the median particle size of the slurry particles, the median particle size D 50 = 1.5±0.2 μm to obtain ball mill slurry; wherein the ball mill adopts a high-energy ball mill, and the parameters of the high-energy ball mill are set as follows: the input energy form is grinding input energy, the input energy value is 80Hz, the diameter of the grinding ball is about 2mm, and the ball The ratio is 1: 10, and the solid content of the control ball mill slurry is 45%, the mass ratio of basic cerium carbonate and basic zirconium carbonate is 2: 8, in terms of mass percentage, the ammonium...

Embodiment 3

[0059] This embodiment provides a method for preparing a cerium-zirconium-doped polishing solution, using basic cerium carbonate and basic zirconium carbonate as precursors, and the preparation method includes the following steps:

[0060] (1) Mix basic cerium carbonate, basic zirconium carbonate, and water in a ball mill, ball mill, and add sodium polyacrylate during the ball milling process, monitor the median particle size of the slurry particles, the median particle size D 50 = 1.5±0.2 μm to obtain the ball mill slurry; wherein the ball mill adopts a high-energy ball mill, and the parameters of the high-energy ball mill are set as follows: the input energy form is grinding input energy, the input energy value is 50Hz, the diameter of the grinding ball is about 2mm, and the ball Ratio is 1: 10, and the solid content of controlling ball mill slurry is 50%, the mass ratio of basic cerium carbonate and basic zirconium carbonate is 2: 8, in terms of mass percentage, the ammonium...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
sizeaaaaaaaaaa
sizeaaaaaaaaaa
specific surface areaaaaaaaaaaa
Login to View More

Abstract

The invention discloses a cerium-zirconium-doped polishing liquid and its preparation method and application. The preparation method uses rare earth carbonate and basic zirconium carbonate as precursors, and through pre-high-energy ball milling, the particle size of raw materials is greatly reduced while passing The energy input reduces the grain boundary energy in the raw material, and the spray drying ensures the uniformity of dispersion between the powder particles while removing the water. After that, combined with a specific secondary calcination method, it can prevent the original crystal from growing too much during the calcination process. Make the crystal grains grow more completely during the calcination process, the crystal lattice is more perfect, the edges and corners are more distinct, and it is easier to obtain materials with small grain size and uniform particle size distribution, thus ensuring that the polishing liquid prepared by the above method is used for polishing blue glass It has high cutting capacity and high surface quality at the same time; in addition, the further ball milling and formula preparation of polishing fluid are completed at the same time during the ball milling process, which not only speeds up the ball milling efficiency, shortens the production cycle, but also is more environmentally friendly.

Description

technical field [0001] The invention belongs to the technical field of optical glass, and in particular relates to the polishing of blue glass, in particular to a cerium-zirconium doped polishing solution and its preparation method and application. Background technique [0002] Before the blue glass was used, most of the filter substrates installed in the camera were made of quartz glass, and a cut-off filter film was coated on the surface of the quartz glass to allow a short wavelength to pass through and reflect part of the red light. In order to block all the red light, several filters are needed to reflect at different angles. The blue glass coated with a cut-off filter film is the same as the quartz substrate, but the blue glass has an additional function of absorbing red light, so that the light in the lens barrel will not interfere with other light due to diffuse reflection, so that The light wave frequency of the wavelength entering the CCD camera is more single, an...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C09G1/02
CPCC09G1/02
Inventor 周利虎李志杰付莹
Owner DEMETER SUZHOU ELECTRONICS ENVIRONMENTAL MATERIALS CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products