Polar plate structure, preparation method thereof, bipolar plate with polar plate structure and fuel cell
A polar plate structure and bipolar plate technology, applied in fuel cells, fuel cell parts, circuits, etc., can solve problems such as short service life and lack of corrosion resistance, and achieve extended life, improved performance, and improved corrosion resistance sexual effect
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[0060] According to an embodiment of the present application, a method for preparing the above-mentioned pole plate structure includes the following steps:
[0061] This embodiment provides a method for preparing a metal bipolar plate, which specifically includes the following steps:
[0062] Step (1): preprocessing, specifically includes the following steps:
[0063] 1) First pretreatment: degreasing, etching, cleaning and drying are performed on the metal substrate 1 in sequence. Specifically, the selected metal substrate 1 is degreased for the first time with 1M sodium hydroxide solution at 80°C; after cleaning, it is cleaned with alcohol for the second degreasing; use alumina polishing paste or diamond Polish the substrate with a brightener such as polishing paste, and then wash it with pure water. The cleaned metal substrate 1 is stored in pure water and cleaned with clean nitrogen before use;
[0064] 2) The second pretreatment: using bias magnetron multi-arc ion coati...
Embodiment 1
[0072] The metal substrate 1 of this embodiment is made of 316L stainless steel.
[0073] Step (1): Use 1mol / L sodium hydroxide solution on the metal substrate 1 for the first degreasing treatment at 80°C; then clean the metal substrate 1 after the first degreasing, and then use alcohol Perform a second degreasing wash. Then, the substrate is polished with alumina polishing paste, cleaned with pure water after polishing, the cleaned metal substrate 1 is stored in pure water, and cleaned with clean nitrogen before use;
[0074] Step (2): Using bias magnetron arc ion coating equipment, the processed metal substrate 1 in step (1) is sent into a vacuum chamber, and the vacuum degree is evacuated to a vacuum of 5×10 -3 Pa, and heat the metal substrate 1 to 180°C, pass in argon gas of about 1 Pa, and set the bias voltage -800V; perform surface ion sputtering on the metal substrate 1, and etch and activate it for 5 minutes;
[0075] Step (3): Set the argon gas flow rate to 300 sccm...
Embodiment 2
[0081] The metal substrate 1 of this embodiment is selected from 316L stainless steel.
[0082] Step (1): Use 1M sodium hydroxide solution to degrease the metal substrate 1 at 80°C for the first time; then clean the metal substrate 1 after the first degreasing, and then perform the second degreasing treatment with alcohol Second degreasing cleaning. Then, the substrate is polished with a diamond polishing paste, cleaned with pure water after polishing, and the cleaned metal substrate 1 is stored in pure water and purged with clean nitrogen before use.
[0083] Step (2): Using bias magnetron arc ion coating equipment, send the processed product in step (1) into a vacuum chamber, and evacuate the vacuum to a vacuum of 5×10 -3 Pa, and heat the metal substrate 1 to 180° C., pass in argon gas of about 1 Pa, and set a bias voltage of -800V; carry out surface ion sputtering and etching activation on the metal substrate 1 for 5 minutes.
[0084] Step (3): Set the argon gas flow rate...
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Abstract
Description
Claims
Application Information
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