Plasmon resonance enhanced substrate and preparation method and application thereof
A plasmon resonance and substrate technology, applied in the field of infrared spectroelectrochemistry, can solve problems such as difficulties, achieve the effects of low cost, high sensitivity infrared spectrum detection, and expand the scope of application
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0041](1) Preparation of single-layer graphene+silicon-silicon dioxide wafer: use chemical vapor deposition to prepare single-layer graphene on a copper substrate (growth gas flow: CH 4 :H 2 =10sccm:50sccm; growth temperature: 1050° C.), and then irradiating the back of the copper substrate with UV / ozone for 45 minutes to remove the inferior graphene on the back of the substrate. Spin-coat polymethyl methacrylate on the front of the copper substrate, and place it on a 100°C electric heating plate to dry for 30 minutes. After drying, put into the etchant (Cu 2 SO 4 :HCl:H 2 (0=20g:100mL:100mL) is etched, and a new etching solution is replaced every 20min. After the third time, the etching solution is left to stand for 12 hours, and the copper is fully etched to obtain polymethyl methacrylate-graphene. . The PMMA-graphene was thoroughly washed with deionized water before being transferred to the surface of a silicon-silica optical wafer. Finally, the polymethyl methacrylat...
Embodiment 2
[0047] The preparation method of this example is the same as that of Example 1, wherein the size of the polystyrene microspheres is 4.25 μm. Fix the silicon-silicon dioxide chip coated with 50nm gold on the surface on the reflection attachment of the infrared instrument, and adjust the optical path externally so that the incident light irradiates the silicon chip coated with 50nm gold on the surface at a fixed angle, and enters the detection after reflection instrument to collect the background spectrum.
[0048] Replace the silicon-silicon dioxide chip coated with 50nm gold on the surface with a plasmon resonance enhanced substrate with an antenna array on the surface, add 0.1M NaF solution, and then use gold / graphene as the working electrode and platinum wire as the counter electrode , the mercury / mercurous sulfate electrode is used as the reference electrode, and the sample spectrum is collected by changing the potential, and the results are shown in the attached Figure 4...
Embodiment 3
[0050] The preparation method of this example is the same as that of Example 1, wherein the size of the polystyrene microspheres is 4.25 μm. Add 0.5M K on the substrate surface 2 SO 4 solution and 5mM K 3 Fe(CN) 6 Solution, using gold / graphene as the working electrode, platinum wire as the counter electrode, mercury / mercurous sulfate electrode as the reference electrode, and cyclic voltammetry scanning in the range of 0.4V to -0.6V at a scan rate of 10mV / s, as attached Figure 5 It is shown that the prepared substrate can effectively realize the electrochemical redox reaction of potassium ferricyanide. Subsequently, the plasmon resonance enhanced substrate was fixed on the reflective attachment of the infrared instrument, and the optical path was adjusted externally, so that the incident light irradiated the silicon wafer coated with gold with a thickness of 50nm at a fixed angle, and entered the detector after reflection. Add 0.5M K on the substrate surface 2 SO 4 Solu...
PUM
| Property | Measurement | Unit |
|---|---|---|
| thickness | aaaaa | aaaaa |
| diameter | aaaaa | aaaaa |
| diameter | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
Login to View More 


