Preparation method of tip of inclined AFM probe with controllable size and inclination angle and ultra-large height-width ratio

A technology of probe tip and inclination angle, which is applied in the field of ultra-large aspect ratio tilted AFM probe tip preparation, can solve the problems of high cost and poor consistency, and achieve the effect of simple method, controllable consistency and high detection accuracy

Pending Publication Date: 2021-06-29
HANGZHOU TANZHEN NANOTECH CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The purpose of the present invention is to aim at the technical defects of the prior art, and to provide a method for preparing an ultra-large aspect ratio inclined AFM probe tip with controllable size and inclination angle, so as to solve the current cost of the conventional preparation process of AFM probes with a large aspect ratio. Expensive, poor consistency and other technical issues

Method used

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  • Preparation method of tip of inclined AFM probe with controllable size and inclination angle and ultra-large height-width ratio
  • Preparation method of tip of inclined AFM probe with controllable size and inclination angle and ultra-large height-width ratio
  • Preparation method of tip of inclined AFM probe with controllable size and inclination angle and ultra-large height-width ratio

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Embodiment 1

[0031] A method for preparing a tilted AFM probe tip with a controllable size and tilt angle, comprising the following steps:

[0032] 1. Double-sided polished SOI wafers are selected as raw materials, which are composed of a device silicon layer, a silicon dioxide layer, and a substrate silicon layer, and the thicknesses are 2.5 microns, 0.5 microns and 350 microns respectively. (Such as figure 2 as shown in a)

[0033] 2. The RCA standard process cleans the sample, so that the surface of the ultraviolet lamp microscope inspection is clean and free of impurities.

[0034] 3. Spin-coat a layer of PMMA photoresist with a thickness of 200 nanometers on the surface of the sample with a forward rotation speed of 500r / min for 5s and a rear rotation speed of 4000r / min for 40s. Place it on a hot plate, heat and bake at 180°C for 1min. (Such as figure 2 b)

[0035] 4. Use an electron beam to photoresist, use an accelerating voltage of 100KeV, a beam current of 100pA, and a dose...

Embodiment 2

[0051] A method for preparing a tilted AFM probe tip with a controllable size and tilt angle, comprising the following steps:

[0052] 1. After cleaning the SOI sheet, spin-coat 200-400nm PMMA photoresist on the surface, and bake at 180°C for 1-2 minutes. The SOI wafer is composed of a device Si layer, an insulating SiO2 layer and a substrate Si layer. The thicknesses of the Si layer of the device, the SiO2 layer and the Si layer of the substrate are 1-5 microns, 0.5-2 microns and 350-500 microns respectively.

[0053] 2. Expose the spin-coated sample with an electron beam exposure machine, and the exposure dose is 500-1000 mJ / cm 2 . After the exposure is completed, put the sample into the developer for 30-50 seconds, and then put it into the fixer for 30-50 seconds.

[0054] 3. Use thermal evaporation, electron beam evaporation or magnetron sputtering equipment to directly deposit 20-30 nanometer Cr or Ti metal film. Or first deposit 3-5 nanometers of Cr or Ti adhesion la...

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Abstract

The invention provides the preparation method of the tip of the inclined AFM probe with the ultra-large height-width ratio, which is controllable in size and inclination angle. According to the technical scheme, by means of the characteristics that a focused ion beam irradiates a suspended micro-nano metal structure so that the micro-nano metal structure can be folded upwards and the folding angle is related to irradiation energy, a metal film is deposited at the top end of a cantilever beam, and the suspended part of the metal structure outside the cantilever beam is irradiated by selecting different focused ion beam parameters, and an inclined AFM probe tip with a controllable inclination angle and an ultra-large height-width ratio is prepared. As a brand-new manufacturing method of the AFM probe with the large aspect ratio, the method is controllable in consistency, suitable for various materials, simple and suitable for mass production. As a core component of the atomic force microscope, the product provided by the invention has higher detection precision.

Description

technical field [0001] The invention relates to the technical field of micro-nano processing, in particular to a method for preparing a tilted AFM probe tip with a controllable size and tilt angle. Background technique [0002] Atomic Force Microscope (AFM) is a commonly used detection equipment. Its basic principle is to use the interatomic force between the probe tip and the sample surface to detect the surface morphology of the sample. It can not only realize three-dimensional surface imaging with nanoscale resolution, but also its The sample does not need to conduct electricity, and can work in complex environments such as the atmosphere, liquid, and low temperature, and can image active samples such as single cells and single molecules. According to the usage, AFM probes are divided into contact probes, non-contact / tapping mode probes, conductive probes, magnetic probes, high aspect ratio probes, diamond-like AFM probes, etc. The shape of the needle tip has a great inf...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01Q60/38B82Y40/00
CPCG01Q60/38B82Y40/00
Inventor 贾宪生崔波朱效立
Owner HANGZHOU TANZHEN NANOTECH CO LTD
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