Lamellar Bi2O2SiO3-Si2Bi24O40 heterogeneous composite photocatalyst and preparation method thereof

A bi2o2sio3-si2bi24o40, lamellar technology, applied in the field of photocatalyst, to achieve the effect of improving photocatalytic performance and controlling overgrowth

Active Publication Date: 2021-08-03
SHAANXI UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Therefore, it is difficult for a single semiconductor photocatalytic material to have both excellent light absorption ability and high photogenerated carrier separation and migration efficiency.

Method used

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  • Lamellar Bi2O2SiO3-Si2Bi24O40 heterogeneous composite photocatalyst and preparation method thereof
  • Lamellar Bi2O2SiO3-Si2Bi24O40 heterogeneous composite photocatalyst and preparation method thereof
  • Lamellar Bi2O2SiO3-Si2Bi24O40 heterogeneous composite photocatalyst and preparation method thereof

Examples

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Effect test

Embodiment 1

[0030] (1) Mix styrene and α-methacrylic acid with deionized water, use potassium persulfate as an initiator, stir at a constant temperature of 60-80°C, and polymerize for 6-10 hours. After the reaction is completed, centrifuge and wash, and finally dissolve in absolute ethanol to obtain a polystyrene (PS) suspension;

[0031] (2) preparing a bismuth nitrate solution with a mass percentage of 60-80%, adding a certain amount of dispersant during the stirring process, and stirring until dissolved to obtain liquid A;

[0032] (3) Slowly add the sodium metasilicate solution (the molar ratio of silicon ions to bismuth ions is 1:1-1:1.5) with a mass percentage of 20-50% into the liquid A, and continue to stir. After mixing evenly, add 12mL of PS suspension to obtain the precursor solution;

[0033] (4) keeping the precursor solution in a stainless steel airtight autoclave with a polytetrafluoroethylene liner at 150-250°C for 8-15 hours, and then naturally cooling to room temperatur...

Embodiment 2

[0036] (1) Mix styrene and α-methacrylic acid with deionized water, use potassium persulfate as an initiator, stir at a constant temperature of 60-80°C, and polymerize for 6-10 hours. After the reaction is completed, centrifuge and wash, and finally dissolve in absolute ethanol to obtain a polystyrene (PS) suspension;

[0037] (2) preparation mass percentage is the bismuth nitrate solution of 60~80%, adds a certain amount of dispersant (comprising citric acid, EG, polyethylene glycol 400, polyethylene glycol 6000 etc., the concentration of each dispersant Controlled at 0.3~1.2mol / L), stir until dissolved to obtain liquid A;

[0038] (3) Slowly add the sodium metasilicate solution (the molar ratio of silicon ions to bismuth ions is 1:1-1:1.5) with a mass percentage of 20-50% into the liquid A, and continue to stir. After mixing evenly, add 16mL of PS suspension to obtain the precursor solution;

[0039] (4) keeping the precursor solution in a stainless steel airtight autoclav...

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Abstract

The invention discloses a lamellar Bi2O2SiO3-Si2Bi24O40 heterogeneous composite photocatalyst and a preparation method thereof. The preparation method comprises the following steps: taking bismuth nitrate pentahydrate and sodium metasilicate nonahydrate as raw materials, absolute ethyl alcohol and deionized water as solvents, citric acid, ethylene glycol (EG), polyethylene glycol 400, polyethylene glycol 6000 and the like as dispersants and polystyrene microspheres (PS) as a modifier, mixing, and reacting in a stainless steel closed high-pressure kettle for 8-15 hours, so that the lamellar Bi2O2SiO3-Si2Bi24O40 heterogeneous composite photocatalyst with more active sites is prepared. The method is easy to operate, the prepared powder is uniform in particle size distribution and good in dispersity, the obtained composite material not only has the function of a new heterostructure, but also provides more active sites due to a smaller and thinner lamellar structure, and shows higher photocatalytic performance.

Description

technical field [0001] The invention belongs to the technical field of photocatalysts, in particular to lamellar Bi 2 o 2 SiO 3 -Si 2 Bi 24 o 40 Heterogeneous composite photocatalyst and preparation method thereof. Background technique [0002] Bismuth-based semiconductors generally have good photocatalytic performance. Its suitable band gap and special layered structure make it have a wide visible light response range and good physical and chemical stability. It is a research hotspot in the field of photocatalysis. . However, there are still problems such as easy electron-hole recombination and narrow response wavelength range, which need to be further improved. [0003] A narrow bandgap can improve the utilization rate of sunlight, and a wide bandgap can inhibit the recombination of photogenerated carriers. Therefore, it is difficult for a single semiconductor photocatalytic material to simultaneously have excellent light absorption ability and high photogenerated ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J23/18
CPCB01J35/004B01J23/18Y02E60/36
Inventor 伍媛婷关梦瑶韩琳王锦荣
Owner SHAANXI UNIV OF SCI & TECH
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