Cyclic trinuclear cuprous complex and application thereof in OLED
A trinuclear cuprous and complex technology, applied in electrical components, circuits, luminescent materials, etc., can solve problems such as poor thermal stability, concentration quenching, poor voltage and current color stability, etc.
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Embodiment 1
[0040] Preparation of Cyclic Trinuclear Copper Complexes
[0041] 1. Synthesize the ligand first:
[0042] The synthetic method of ligand 3,5-dimethyl-4-isobutylpyrazole is: utilize 2mmol acetylacetone and 1mmol 4-bromoisobutyl, in 4mmol potassium carbonate as base, 6mmol 18-crown ether- 6 is used as a phase transfer catalyst and refluxed in an acetone solution, the reaction temperature is 62° C., and the reaction time is 16 hours. The crude product of 3-isobutyl-2,4-pentanedione is formed after nucleophilic reaction. The crude product was then separated by thin-layer chromatography with ethyl acetate and petroleum ether at a volume ratio of 1:6 to obtain pure product. Then, 1 mmol of 3-isobutyl-2,4-pentanedione and 3 mmol of hydrazine hydrate are used for ring closure to generate the pyrazole, and the total yield of the two steps is 50%. The synthetic route of ligand 3,5 dimethyl-4-isobutylpyrazole is as follows figure 1 , the prepared ligand's 1 H-NMR picture as image...
Embodiment 2
[0050] Build the film:
[0051] Weigh 1 mg of the cyclic trinuclear cuprous complex and 100 mg of polymethyl methacrylate, dissolve in 2 mL of dichloromethane solvent, and evaporate to dryness to obtain a PMMA film with a content of 1%. Optimum Excitation Wavelength λ for 1% PMMA Thin Films ex is 300nm, and the maximum emission wavelength is 674nm ( Figure 10 b), the absolute quantum yield is also close to 100%, and the lifetime is 9.02us.
Embodiment 3
[0053] Construction of non-doped OLED devices:
[0054] First on the ITO glass with a resistance of 10Ω / sq Continuously evaporate the organic layer HAT-CN, TAPC, TCTA, TmPyPb at the rate of 0.5nm~2nm cyclic trinuclear cuprous complexes by co-deposition technology, and finally use 0.02nm / s and 2nm / s respectively LiF and Al were vapor-deposited at a rate of 100%, and the obtained non-doped OLED device structure was ITO / HAT-CN / TAPC / TCTA / Cu 3 L 3 / TmPyPb / LiF / Al. (See Figure 11 a), the vapor deposition conditions are: at a pressure of 10 - 7 Vacuum thermal evaporation is carried out at mbar. Among them, ITO is indium tin oxide, HAT-CN is 2,3,6,7,10,11-hexacyano-1,4,5,8,9,12-hexaazatriphenylene, and TAPC is 4- [1-[4-[bis(4-methylphenyl)amino]phenyl]cyclohexyl]-N-(3-methylphenyl)-N-(4-methylphenyl)aniline, TCTA is 4,4',4"-tris(carbazol-9-yl)triphenylamine, TmPyPb is 3,3'-[5'-[3-(3-pyridyl)phenyl][1,1':3 ',1"-terphenyl]-3,3"-diyl]dipyridine. When the light-emitting layer is...
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