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Method for adsorbing and purifying impurities by using high-purity benzyl chloride

A benzyl chloride, high-purity technology, applied in the field of compound purification and impurity removal, can solve the problems of complex structure of rectification tower, increase of process complexity, low production efficiency, etc., and achieve the effect of improving product purity, reducing pollution and simplifying the process

Active Publication Date: 2022-01-07
常州新东化工发展有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] However, the added inhibitor needs to be separated from the product, which increases the complexity of the process, and although the content of o-chlorotoluene, p-chlorotoluene, and benzaldehyde can be reduced by vacuum distillation, the structure of the rectification tower is relatively complicated, and the energy consumption High, which will lead to higher production costs and lower production efficiency

Method used

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  • Method for adsorbing and purifying impurities by using high-purity benzyl chloride

Examples

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Effect test

example 1

[0034] Configure the critical glue solution of ammonium surfactant hexamethyltrimethylammonium bromide, impregnate activated carbon in solution, oscillated at 30 ° C for 6 h, then washed unreacted surfactants with deionized water, and finally Filtration, dried to obtain modified activated carbon. The modified activated carbon was activated at 300 ° C in a muffle, 0.79 g of a sized adsorption device (toluene content 245 ppm, o-chlorozene content of 20 mL), was grounded to 20 mL of the adsorption device (toluene content of 245 ppm, o-chlorohydrophylene content 137 ppm) The chlorobenzene content is 66 ppm, the benzaldehyde content of 669 ppm, and the remaining impurities 3725 ppm) The injection pump enters the U-tube in the U-tube at a rate of 5 mL / h, and 58 ppm is collected at the adsorption column exit after the adsorption post. 21 ppm, toluene content of 38 ppm, benzaldehyde content 129 ppm, and the remaining impurities 1373 ppm high purity chlorinated chlorinated chlorinated ch...

example 2

[0036] The critical gum solution of sodium surface active dodecyl sulfate was configured, and the activated carbon was immersed in a solution, oscillated at 30 ° C for 6 h, then washed the unreacted surfactant with deionized water, and finally filtered through vacuum, dried Modified activated carbon. The modified activated carbon was placed under the conditions of the muffle at 300 ° C for 3 h, 20 to 30 mesh, 8.99 g of the adsorption device of 20 ml, and a chlorinated material (toluene content of 245 ppm, o-chlorohydrophylene content 137 ppm) The chlorobide content is 41 ppm, the benzaldehyde content of 669 ppm, and the remaining impurities 3725 ppm) The injection pump enters the U-tube at a rate of 8 ml / h, and after 95 minutes, the other side is collected at the other side of the material to 78 ppm, pair The chlorobenyl is 10 ppm, the toluene content is 92 ppm, and the benzaldehyde content is 202 ppm, and the remaining impurities 1482 ppm high purity chlorinated chlorinated chl...

example 3

[0038]Configuring a colloidal solution critical dodecylbenzene sulfonate surfactants, activated carbon is immersed in the solution, shaken at 30 deg.] C 6h, and then rinsed with deionized water, unreacted surfactant, and finally through vacuum filtration, and dried to give modified activated carbon. Under the activation conditions of the modified activated carbon placed in a muffle furnace of 300 deg.] C 3h, ground to 20-30 mesh, was charged 20mL size of the adsorbing device 10.07 g, chlorotoluene starting material content of benzyl chloride (content of 245 ppm toluene, o- 137 ppm, chlorotoluene content of 41ppm, benzaldehyde content is 669ppm, the remaining impurities 3725ppm) with a syringe pump 10mL h speed / into the U-tube, after 64 minutes into the other side of the sample collected at the o-chlorotoluene content of 93ppm in the raw material, 41ppm chlorine content of toluene, the toluene content of 134 ppm, 209 ppm benzaldehyde content, the remaining impurities 1368ppm high...

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Abstract

The invention relates to a method for adsorbing and purifying impurities through high-purity benzyl chloride, and belongs to the technical field of compound purification and impurity removal. According to the method, after an adsorbent is pretreated and activated under a high-temperature condition, o-chlorotoluene, parachlorotoluene, toluene, benzaldehyde and other impurities in a raw material benzyl chloride are removed by a dynamic adsorption method. The method can greatly reduce the content of o-chlorotoluene, p-chlorotoluene, toluene, benzaldehyde and other impurities in benzyl chloride, especially reduce the content of o-chlorotoluene / p-chlorotoluene, improve the purity of benzyl chloride, and is convenient and safe in process operation, and suitable for large-scale production.

Description

Technical field [0001] The present invention relates to a method of high purity chlorinated chloride adsorption purification impurities, which belongs to the field of compound purification and breeding technology. Background technique [0002] Benzyl chloride and benzene chloride or phenylene chloroform is a colorless or micro-yellow transparent liquid having a strong irritating odor, miscible with organic solvents such as chloroform, ethanol, diethyl ether, insoluble in water but can be Vapor together. Chlorinated intermediates are important intermediates in organic chemicals, widely used in dyes, pesticides, synthetic fragrances, and plasticizers, common products with chlorinated products, penicillin, benzyl alcohol, octane phosphorus, benzyl group Triethyl chloride or the like. At present, my country's chlorinated benzyl production is about 120,000 tons, of which 80% are used to produce low in fine chemicals, and the number of drugs is high. The application is expanding. [00...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C07C17/389C07C22/04
CPCC07C17/389C07C22/04Y02P20/10
Inventor 李景林刘定华陈鹏飞周驰中赵晓龙韩仁鹏
Owner 常州新东化工发展有限公司
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