Method for growing graphene on structured copper base, cable core material and preparation method of cable core material
A technology of cable core material and graphene, which is applied in the direction of cable/conductor manufacturing, conductive materials, conductive materials, etc., can solve the problems of product conductivity decline, equivalent resistance increase, uneven current distribution, etc., and achieve good electrical performance , Improve life and performance, improve oxidation resistance and corrosion resistance
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[0038] The method for preparing the cable core material of the present invention is to form the copper-based graphene formed by the above method to form a cable core material by step S3: recooling, sintering and thermosetting wire. Among them, the specific steps of step S3 include:
[0039] Step S31: Refused the copper-based graphene, the complex operation is the static pressure operation, the like is 300 ~ 500 MPa;
[0040] Step S32: Sintering after the recurning copper-based graphene is sintered under argon, the sintering temperature is 900 ° C, the sintering time is 1 to 3 h;
[0041] Step S33: Put the sintered copper-based graphene in the thermal extruder to extrud the fine strip to form a cable core material, and the mold temperature in the heat squeeze press is 900 ° C.
[0042] It is worth mentioning that the sintered copper-based graphene is placed in the direction of the thermal extruder is perpendicular to the direction of the copper foil, which ensures that the copper f...
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[0046] Example one
[0047] Step S1: The copper foil is cut according to the mold size, alternately laminated in a mold in a mold, and is placed in the mold, and is formed by the like, and the ingot is formed, and the static pressure is 5 MPa.
[0048] Step S21: The ingot is placed in a crucible, and the intermediate position of the chemical gas phase deposit; first, the chemical gas phase deposit furnace is evacuated, so that the air pressure in the chemical gas deposits slowly decreases, until the furnace is fell to 10 -2 PA, then open the argon valve, carrying argon to rinse the chemical gas phase deposited furnace while closing the vacuum valve to remove other gases such as oxygen in the chemical gas deposit. When the air pressure in the stove rises to normal pressure, the argon valve is adjusted to keep the argon flow at 120 sccm while opening the exhaust valve of the chemical gas depositing furnace. Under the protection of 120 SCCM argon, the furnace was tapered at a rate of...
Example Embodiment
[0055] Example 2
[0056] Step S1: The copper foil is cut according to the mold size, alternately laminated in a mold in a 0.1 g of copper foil and 3 g of copper powder, and is formed into a mold, and a ingot is formed, and the ingot is formed, and the like is 8 MPa.
[0057] Step S21: The ingot is placed in a crucible, and the intermediate position of the chemical gas phase deposit; first, the chemical gas phase deposit furnace is evacuated, so that the air pressure in the chemical gas deposits slowly decreases, until the furnace is fell to 10 -2 PA, then open the argon valve, carrying argon to rinse the chemical gas phase deposited furnace while closing the vacuum valve to remove other gases such as oxygen in the chemical gas deposit. When the air pressure in the stove rises to normal pressure, the argon valve is adjusted to maintain the argon flow at 100 Sccm while opening the exhaust valve of the chemical gas depositing furnace. Under the protection of 100 SCCM argon, the furn...
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