Perovskite light emitting diode and preparation method thereof
A light-emitting diode and perovskite technology, which is applied in the field of new semiconductor light-emitting devices, can solve problems affecting the service life of the device, perovskite decomposition, and damage to electrical properties, and achieve the effects of improving service life, improving stability, and reducing erosion
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Embodiment 1
[0042] (1) The ITO glass of the transparent electrode was etched, and then ultrasonically cleaned with surfactant, deionized water, acetone, isopropanol and ethanol for 10 minutes, and then the electrode surface was treated with ultraviolet ozone.
[0043] (2) Dissolve 1.017 g of tetramethoxyammonium hydroxide pentahydrate in 10 ml of ethanol, dissolve 0.6719 g of zinc acetate in 30 ml of dimethyl sulfoxide, mix and stir the two for 24 hours and then use ethyl acetate Esters were extracted, and the deposited zinc oxide solid particles were extracted with a centrifuge, and then dissolved in 5 ml of ethanol. The ethanol solution of zinc oxide was spin-coated on the ITO at 5000 rpm, and heat-treated on a hot stage at 150° C. for 30 minutes to obtain a ZnO electron injection layer. The thickness of ZnO was about 30 nanometers.
[0044] (3) PEIE was dissolved in methoxyethanol with a solubility of 4 mg / ml, spin-coated with a spin coater at 5000 rpm, and then placed on a hot stage a...
Embodiment 2
[0051] A perovskite light-emitting diode was obtained in the same manner as in Example 1 except that CH(NH 2 ) 2 I. CH 3 NH 2 I, CsI and PbI 2 Dissolve in dimethylformamide (DMF) solvent at a molar ratio of 2.2:0.15:0.1:1; 5-AVAI and PbI 2 The ratio of is 0.3; the concentration of PMMA is 2 mg / ml; the concentration of TFB is 14 mg / ml; the thickness of molybdenum oxide film is 10 nm and the thickness of gold electrode is 80 nm.
[0052] The current-voltage curve of the perovskite light-emitting diode of embodiment 2 and the relationship between irradiance and voltage are shown in Figure 4 (a) of. The normalized external quantum efficiency degradation trend with time at an applied current density of 100 mA / cm2 is shown in Figure 4 (b) of.
[0053] It can be seen from the above experimental data that the introduction of the PMMA layer can suppress the degradation of the external quantum efficiency, thereby greatly improving the service life of the device.
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