Photosensitive composition and new compound therefor

A technology of photosensitive composition and compound, applied in the field of photosensitive composition, which can solve the problems of unknown scanning exposure with sufficient sensitivity photoinitiating system

Active Publication Date: 2004-10-06
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, no photoinitiation system is known that is sufficiently sensitive for scanning exposure in the short-wavelength region of 350nm to 450nm

Method used

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  • Photosensitive composition and new compound therefor
  • Photosensitive composition and new compound therefor
  • Photosensitive composition and new compound therefor

Examples

Experimental program
Comparison scheme
Effect test

specific example

[0163]

[0164]

[0165]

[0166]

[0167] (6) Organic peroxides:

[0168] In the case of using an organic peroxide-based initiator compound, generation of radicals as an active source can be performed with very high sensitivity.

[0169] "Organic peroxides" (6) as other examples of the initiator compound (compound (B)) used in the present invention include almost all organic compounds containing one or more oxygen-oxygen bonds in the molecule. Examples include: methyl ethyl ketone peroxide, cyclohexanone peroxide, 3,3,5-trimethyl-cyclohexanone peroxide, methylcyclohexanone peroxide, acetylacetone peroxide, 1 , 1-bis(tert-butylperoxy)-3,3,5-trimethylcyclohexane, 1,1-bis(tert-butylperoxy)cyclohexane, 2,2-bis(tert-butyl Butane peroxide, tert-butyl hydroperoxide, cumene hydroperoxide, di-isopropylbenzene hydroperoxide, p-methane hydroperoxide, 2,5-dimethylhexane-2,5- Dihydrogen peroxide, 1,1,3,3-tetramethylbutyl hydroperoxide, di-tert-butyl hydroperoxide, tert-butyl...

Embodiment 1 to 16 and comparative example 1 to 7

[0601] (preparation of carrier)

[0602] Etching was performed by immersing an aluminum plate having a thickness of 0.3 mm in 10% by weight sodium hydroxide at 60° C. for 25 seconds, washed with running water, neutralized and rinsed with 20% by weight of nitric acid, and then washed with water. In 1% by weight nitric acid aqueous solution, the anode current is 300 coulomb / dm 2 , using a sinusoidal alternating current waveform, electrolytic roughening was performed on the obtained aluminum plate. Next, after immersing the obtained aluminum plate in 40 degreeC 1 weight% sodium hydroxide aqueous solution for 5 seconds, it immersed in 30 weight% sulfuric acid aqueous solution, and performed desmutting treatment at 60 degreeC for 40 seconds. Then, in 20% by weight sulfuric acid aqueous solution, the current density is 2A / dm 2 Next, anodize the aluminum plate for 2 minutes so that the thickness of the anodized film is 2.7g / m 2. The surface roughness was measured and found to be ...

Embodiment 17 to 29 and comparative example 6

[0663] On the support used in Examples 1 to 13, the underlying interlayer, photosensitive layer and protective layer were successively formed to prepare a lithographic printing plate precursor.

[0664] (interlayer coating)

[0665] On the surface of the carrier, a coating solution (A) having the following formulation was prepared so that the coating amount of phenylphosphonic acid was 20 mg / m 2 , and using a wheeler (wheeler), coating was performed under the condition of 180 rpm, followed by drying at 80° C. for 30 seconds to form an interlayer.

[0666] (Interlayer Coating Solution A)

[0667] Phenylphosphonic acid: 0.07g to 1.4g

[0668] Methanol: 200g

[0669] (Coating of photosensitive layer)

[0670] On the support provided with an interlayer thereon, a photosensitive composition having the following formulation was prepared so that the coating amount was 1.0 to 2.0 g / m 2 , and was coated using a wheeled vehicle, followed by drying at 100° C. for 1 minute to form a ph...

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Abstract

A photosensitive composition containing: a sensitizing dye represented by the formula (1) as defined herein; an initiator compound capable of generating a radical, an acid, or a base; and a compound whose physical or chemical characteristic irreversibly changes by at least one of a radical, an acid, and a base.

Description

technical field [0001] The present invention relates to a photosensitive composition which cures at high sensitivity by exposure and to a novel compound for its use. In detail, the present invention relates to a photosensitive composition used as a photosensitive layer of a lithographic printing plate precursor forming an image by digital signal-based scanning exposure, and to a novel dye compound having excellent photothermal conversion performance. Background technique [0002] Here, a PS plate having a structure in which a lipophilic photosensitive resin layer is provided on a hydrophilic support is widely used as a planographic printing plate. As for its production method, in general, a desired printing plate is obtained by dissolving and removing non-image areas after exposure from a mask of a lithographic film (surface exposure). [0003] In recent years, digital technology of electronic processing, storage and output of image information using computers have become w...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B41C1/10C07D263/46C07D263/48C07D455/04C09B23/00C09B26/02C09B55/00G03F7/00G03F7/031
CPCG03F7/031Y10S430/106Y10S430/114Y10S430/127B41C1/1008B41C1/1016B41C2201/02B41C2201/14B41C2210/02B41C2210/04B41C2210/06B41C2210/22B41C2210/24
Inventor 涉谷明规
Owner FUJIFILM CORP
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