Method for preparing ZnO ceramic film low-voltage piezoresistor
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- HUAZHONG UNIV OF SCI & TECH
- Publication Date
- 2005-03-16
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to a preparation method of a ZnO ceramic film varistor. Background technique
[0002] At present, in the preparation of ZnO ceramic thin-film varistors, the film thickness used is generally tens to hundreds of nm. Because the film thickness is too small, the pressure-sensitive performance and stability are relatively poor, making it difficult for varistors to achieve Practical application requirements. In order to optimize its performance, it is necessary to increase the film thickness, and the increase of film thickness is prone to cracks, which will reduce the performance of the film. Contents of the invention
[0003] The purpose of the present invention is to overcome the shortcomings of the above-mentioned prior art and provide a method for preparing a ZnO ceramic film low-voltage varistor. In this method, by doping bismuth ions Bi 3+ , antimony ion Sb 3+ , manganese ions Mn 2+ , chromium ion Cr 3+ , cobalt ion Co 3+...