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Magnetic head and magnetic recording/reproducing system

a magnetic recording/recording and head technology, applied in the field of magnetic head, can solve the problems of low yield, difficulty in reducing the shield to shield distance to 70 nm or less, and still have problems to be solved, and achieve the effect of high yield and high outpu

Inactive Publication Date: 2006-05-25
HITACHI GLOBAL STORAGE TECH JAPAN LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

"The present invention provides a magnetoresistive head with a CPP structure that has a high yield and is less damaged by mechanical polishing. The head has a deformation prevention layer that prevents deformation during processing and has a high output when air bearing surface processing is carried out. The invention also provides a magnetic recording / reproducing system with high linear and areal recording density that incorporates the magnetoresistive head. The technical effects of the invention are improved performance and reliability of the magnetoresistive head for high-density magnetic recording applications."

Problems solved by technology

To achieve a narrower shield to shield distance, in the case of a so-called CIP (Current Into the Plane) GMR film in which a sensing current is applied to the plane of a magnetoresistive film, as the thickness of an insulating gap layer interposed between shield layers and the GMR film and between shield layers and electrode films for supplying a sensing current to the GMR film become small and a sensing current leaks out into the shield layer, when the shield to shield distance is set to about 80 nm or less, the yield greatly lowers, and it is technically difficult to reduce the shield to shield distance to 70 nm or less.
Since the CPP structure is a new structure unlike the CIP structure whose technology is becoming mature, it still has some problems to be solved.
One of the problems is a air bearing surface processing technology.
However, the step of obtaining a desired sensor height using the plasma process disclosed by JP-A 11-175927 in air bearing surface processing has a poor throughput, is not practical and needs mechanical polishing.
Therefore, the main cause of deteriorating properties during air bearing surface processing is the shield layer.
More specifically, when a air bearing surface is to be polished, a metal constituting the shield layer is dragged from the insulating gap film to the GMR film, thereby causing a phenomenon that a sensing current leaks out from the GMR film into the shield layer to greatly reduce output.
However, as the magnetoresistive film, the gap layer and the shield layer are made from a metal in the CPP structure head, all of them are readily deformed, whereby the dragging of a metal constituting the shield layer which occurs in the CIP structure head occurs, and also the deterioration of characteristics is caused by the deformation of the gap layer and the deformation of the magnetoresistive film (disorder and fault of the laminate structure).
Therefore, in the case of the CPP structure head, taking the mechanical properties of only the shield layer into consideration is unsatisfactory, and it is important that the magnetoresistive film, the gap layer and the shield layer should be entirely made difficult to be deformed.

Method used

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  • Magnetic head and magnetic recording/reproducing system
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  • Magnetic head and magnetic recording/reproducing system

Examples

Experimental program
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Effect test

embodiment 1

[0049]FIG. 1 shows the structure of the air bearing surface of the magnetoresistive head of the present invention. A lower shield layer 11 made from a Ni—Fe alloy and having a predetermined shape is formed on an alumina-titanium carbide substrate coated with an insulator such as alumina, and a lower first deformation prevention layer 13 made from Mo, a lower gap layer 131 made from Ta, a CPP magnetoresistive film 50, an upper gap layer 141 made from Cu and an upper first deformation prevention layer 14 made from Mo are formed on the lower shield layer 11.

[0050] The CPP magnetoresistive film 50 consists of a seed layer 15 made from a metal for controlling the orientation of a laminate film formed thereon, for example, 81 at. % Ni-19 at. % Fe, an antiferromagnetic layer 16 made from 52 at. % of Pt and 48 at. % of Mn, a second ferromagnetic layer 17 made from 75 at. % of Co and 25 at. % of Fe, a tunnel barrier layer 18 made from aluminum oxide and a first ferromagnetic layer 19 made f...

embodiment 2

[0073] In Embodiment 1, the lower first deformation prevention layer 13 and the upper first deformation prevention layer 14 have substantially the same width in the track direction as the CPP magnetoresistive film 50. In this embodiment shown in FIG. 5, they have a larger width than the CPP magnetoresistive film 50. The lower first deformation prevention layer 13 can be made as wide as the lower shield layer 11 and the upper first deformation prevention layer 14 can be made as wide as the upper shield layer 12.

[0074] One example of the production process is as follows. After the lower shield layer 11 is formed, the lower first deformation prevention layer 13 is formed and patterned to a desired shape by a dry etching method or ion milling method. The CPP magnetoresistive film 50 is formed, a lift-off mask is formed at a position which becomes a magnetic sensing portion, and the upper gap layer and the CPP magnetoresistive film excluding the magnetic sensing portion are etched by th...

embodiment 3

[0076] In the structure of Embodiment 2 (FIG. 5), in order to reduce contact resistance between the lower first deformation prevention layer 13 and the shield layer 15 and between the first ferromagnetic layer 19 and the upper first deformation prevention layer 14, the surfaces of the lower first deformation prevention layer 13 and the first ferromagnetic layer 19 must be cleaned by sputter etching or the like. This cleaning varies the thickness of the lower first deformation prevention layer 13 and the thickness of the first ferromagnetic layer 19, whereby the distance between the lower shield layer and the upper shield layer (to be herein referred to as a “shield to shield distance”) changes in the former case and read sensitivity and the asymmetry of the output wavelength vary in the latter case.

[0077]FIG. 6 shows the structure capable of reducing changes in properties caused by cleaning. After the lower shield layer 11 is formed and its surface is cleaned by sputter etching or ...

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Abstract

A high output, magnetoresistive head with a CPP structure is disclosed which reduces or prevents deformation near the air bearing surface of the read element portion layer at the time of air bearing surface processing. In the CPP structure magnetoresistive head, the deformation near the air bearing surface as a result of mechanical polishing during the air bearing surface processing can be reduced by forming deformation prevention layers having a higher shear modulus than the first ferromagnetic layer, and a second ferromagnetic layer between a magnetoresistive film and at least one of a lower shield layer and an upper shield layer.

Description

CROSS-REFERENCE TO RELATED APPLICATION [0001] This application is a Continuation of U.S. App. Ser. No. 10 / 369,682 filed on Feb. 21, 2003, and claims priority from U.S. App. Ser. No. 10 / 369,682 filed on Feb. 21, 2003, which claims priority from Japanese Patent Application Nos. 2002-252348 and 2003-001669, filed on Aug. 30, 2002 and Jan. 3, 2003, respectively, the entire disclosures of which are incorporated herein by reference.BACKGROUND OF THE INVENTION [0002] 1. Field of the Invention [0003] The present invention relates to a magnetic head having a CPP (Current Perpendicular to the Plane) structure in which a sensing current is applied in a direction substantially perpendicular to the interface between the first ferromagnetic layer and the intermediate layer of a magnetoresistive film and the interface between the intermediate layer and the second ferromagnetic layer of the film and to a magnetic recording / reproducing system having the magnetic head. [0004] 2. Description of the Re...

Claims

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Application Information

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Patent Type & Authority Applications(United States)
IPC IPC(8): G11B5/33G11B5/10G11B5/31G11B5/39G11B5/40H01L43/08
CPCB82Y10/00B82Y25/00G11B5/102G11B5/3106G11B5/3133G11B5/3163G11B5/398G11B5/3903G11B5/3909G11B5/40G11B2005/3996G11B5/3912G11B5/3169
Inventor WATANABE, KATSUROKUSUKAWA, KIKUOSHINTANI, TAKUMEGURO, KENICHI
Owner HITACHI GLOBAL STORAGE TECH JAPAN LTD
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