Unlock instant, AI-driven research and patent intelligence for your innovation.

Film-Forming Composition, Film Formed Thereby, and Method for Manufacturing Organic Semiconductor Element Using Same

a film-forming composition and film-forming technology, applied in the field of film-forming composition and film-forming process, can solve the problem of difficulty in obtaining film-forming compositions that satisfy both requirements

Active Publication Date: 2016-06-23
CENT GLASS CO LTD
View PDF6 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Benefits of technology

The present invention provides a film-forming composition for use in manufacturing semiconductor devices. The composition includes a specific fluorine-containing solvent that does not dissolve or swell the organic material, and a specific fluororesin soluble in the fluorine-containing solvent. When applied to an organic semiconductor film, the composition does not affect the film and can be patterned using photolithography, print, or imprint processes. The fluororesin film can also be used as an interlayer insulating film in organic semiconductor elements as it has good properties such as ease of processability, high heat resistance, and suitable glass transition temperature. The invention also provides a method for synthesizing the fluororesins used in the composition. Overall, this film-forming composition and method provide a reliable and effective way to produce high-quality semiconductor devices.

Problems solved by technology

However, it has been difficult to obtain film-forming composition satisfying both of these two conditions.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Film-Forming Composition, Film Formed Thereby, and Method for Manufacturing Organic Semiconductor Element Using Same
  • Film-Forming Composition, Film Formed Thereby, and Method for Manufacturing Organic Semiconductor Element Using Same
  • Film-Forming Composition, Film Formed Thereby, and Method for Manufacturing Organic Semiconductor Element Using Same

Examples

Experimental program
Comparison scheme
Effect test

synthesis example 1

Comparative Resin Synthesis Example 1

[0203]In a reaction vessel, 5.00 g (35.2 mmol) of n-butyl methacrylate, 10.0 g of butanone and 0.162 g (0.704 mmol) of initiator were placed. The resulting solution was subjected to radical polymerization by the method described in the above section “Synthesis of Fluororesins”. As a result, there was obtained 0.88 g of fluororesin 14 having a repeating unit of the following formula (22). The weight-average molecular weight Mw of the fluororesin 14 was 16,000. The molecular weight distribution Mw / Mn of the fluororesin 14 was 1.48. The yield of the fluororesin 14 relative to the total mass of the monomer used was 18 mass %.

synthesis example 2

Comparative Resin Synthesis Example 2

[0204]In a reaction vessel, 10.00 g (63.2 mmol) of 2-ethoxyethyl methacrylate, 10.0 g of butanone and 0.225 g (0.977 mmol) of initiator were placed. The resulting solution was subjected to radical polymerization by the method described in the above section “Synthesis of Fluororesins”. As a result, there was obtained 6.21 g of fluororesin 15 having a repeating unit of the following formula (23). The weight-average molecular weight Mw of the fluororesin 15 was 8,000. The molecular weight distribution Mw / Mn of the fluororesin 15 was 1.45. The yield of the fluororesin 15 relative to the total mass of the monomer used was 62 mass %.

[0205][Evaluation Test on Solubility of Fluororesins in Fluorine-Containing Solvents]

[0206]The fluororesins 1 to 13, the comparative fluorine-free resins 14 and 15 and polymethyl methacrylate (hereinafter sometimes referred to as “PMMA”; polystyrene-conversion weight-average molecular weight: 15,000) available from Sigma-Al...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
compositionaaaaaaaaaa
film-forming aaaaaaaaaa
semiconductoraaaaaaaaaa
Login to View More

Abstract

A film-forming composition according to the present invention includes: a fluororesin having a repeating unit of the general formula (1); and a fluorine-containing solvent.In the general formula (1), R1 each independently represents a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group; and R2 each independently represents a C1-C15 straight, C3-C15 branched or C3-C15 cyclic fluorine-containing hydrocarbon group in which any hydrogen atom may be replaced by a fluorine atom with the proviso that the repeating unit contains at least one fluorine atom; andThis film-forming composition is suitably usable for the manufacturing of an organic semiconductor element because the composition can form a film on an organic semiconductor film; and the formed film has resistance to an etching solvent during the fine pattern processing of the organic semiconductor film by photolithography etc.

Description

FIELD OF THE INVENTION[0001]The present invention relates to a film-forming composition for forming a film on an organic semiconductor film. The present invention also relates to a film formed from the film-forming composition and a method for manufacturing an organic semiconductor element using such a film.BACKGROUND ART[0002]Organic semiconductor materials are organic substances having the properties of semiconductors. There are known various organic semiconductor materials and organic charge-transfer materials, including: organic low-molecular compounds such as pentacene, anthracene, tetracene and phthalocyanine; polyacetylene-based conductive polymers; polyphenylene-based conductive polymers such as polyparaphenylene and derivatives thereof, polyphenylene vinylene and derivatives thereof and the like; heterocyclic conductive polymers such as polypyrrole and derivatives thereof, polythiophene and derivatives thereof, polyfuran and derivatives thereof and the like; and ionic condu...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(United States)
IPC IPC(8): H01L51/00G03F7/004H10K99/00
CPCH01L51/0018G03F7/0046H01L51/0019C09D133/16C08K5/02C08K5/06G03F7/0002G03F7/0048H10K71/236H10K71/233H10K85/615H10K10/484
Inventor TERUI, YOSHIHARUKOMORIYA, HARUHIKOKOBAYASHIHARA, YUKARIHARA, IKUNARI
Owner CENT GLASS CO LTD