Medical TiNi shape memory alloy sputtered by Ti-Ta-C-O composite film on surface and its production
A memory alloy, composite film technology, applied in sputtering coating, metal material coating process, ion implantation coating and other directions, can solve the problems of TiNi alloy radiation opacity, unsatisfactory visibility, etc. Improved permeability and biocompatibility
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Embodiment 1
[0025] The first step: substrate pretreatment
[0026] Select the medical TiNi shape memory alloy substrate with equiatomic ratio, after grinding and polishing, ultrasonic cleaning with absolute ethanol for 3 times, and ultrasonic cleaning with deionized water for 3 times to obtain the sample;
[0027] The second step: oxidation treatment
[0028] The sample prepared in the first step is reacted in an oxygen atmosphere to make the surface generate TiO 2 sample; among them, the oxidation temperature is 150°C, and the pressure is 1×10 3 Pa, oxidation time 50min;
[0029] The third step: ion implantation to make the reinforcement phase
[0030] (A) the described second step that contains TiO 2 The samples were placed in a metal vapor vacuum arc ion source ion implanter for argon ion sputtering to remove surface impurities; among them, the vacuum degree was 1×10 -3 Pa, energy 5KeV, time 20min;
[0031] (B) After treating with argon ions containing TiO 2 The sample was first...
Embodiment 2
[0050] The first step: substrate pretreatment
[0051] Select a medical TiNi shape memory alloy substrate with an equiatomic ratio, and after grinding and polishing the substrate, ultrasonically clean it 5 times with absolute ethanol, and then ultrasonically clean it 5 times with deionized water to obtain a sample;
[0052] The second step: oxidation treatment
[0053] The sample prepared in the first step is reacted in an oxygen atmosphere to make the surface generate TiO 2 sample; among them, the oxidation temperature is 600°C, and the pressure is 1×10 6 Pa, oxidation time 20min;
[0054] The third step: ion implantation to make the reinforcement phase
[0055] (A) the described second step that contains TiO 2 The samples were placed in a metal vapor vacuum arc ion source ion implanter for argon ion sputtering to remove surface impurities; among them, the vacuum degree was 3×10 -3 Pa, energy 8KeV, time 10min;
[0056] (B) After treating with argon ions containing TiO ...
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