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Method for preparing interval and configuration adjustable nano particle ordered array

A technology of nanoparticles and ordered arrays, which is applied in the field of preparation of ordered arrays of nanoparticles with adjustable spacing and configuration, can solve the problems of high efficiency and low cost that have not yet been formed, and achieve good long-range order, low cost, and overcome uncontrollable effects

Inactive Publication Date: 2009-06-24
NANJING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In short, for the large-scale preparation of ordered arrays of nanoparticles with a size less than 30 nanometers with adjustable spacing and configuration, there is no general method with high efficiency and low cost.

Method used

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  • Method for preparing interval and configuration adjustable nano particle ordered array
  • Method for preparing interval and configuration adjustable nano particle ordered array
  • Method for preparing interval and configuration adjustable nano particle ordered array

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] Example 1 A method for preparing an ordered array of nanoparticles with adjustable spacing and configuration, the preparation steps are as follows:

[0026] (1) Dissolve 0.1g of polystyrene-polybutadiene-polystyrene (SBS) triblock polymer in 9.9g of toluene to form a final solution of 1wt% by weight; The solution was spin-coated on a clean quartz glass sheet at 2500rpm; the quartz glass sheet was placed in a weighing bottle, and 5ml of toluene was dropped in it, and then the weighing bottle was sealed with cotton cloth to control the evaporation rate and prepare a template with parallel columnar shapes in the plane ;

[0027] (2) Fix the template of the above-mentioned ordered pattern on the rotatable substrate holder 5, and then seal the substrate holder 5 in a suitable position in the high vacuum deposition chamber 8;

[0028] (3) Utilize pumping system Rhodes pump 9 and molecular pump 10 to evacuate, make the vacuum degree of deposition chamber 8 be 5 * 10 -5 At Pa...

Embodiment 2

[0030] Example 2 A method for preparing an ordered array of nanoparticles with adjustable spacing and configuration, the preparation steps are as follows:

[0031] (1) 0.05g polystyrene-polymethyl methacrylate diblock polymer is dissolved in 9.95g chloroform, forms the final solution that percentage by weight is 0.5wt%; 25 μ l final solution is spun with 2800rpm with micro sampler Apply on a clean silicon wafer; place the silicon wafer in a weighing bottle, drop 10ml of chloroform into it, then seal the weighing bottle with aluminum foil to control the evaporation rate and prepare a template with an ordered porous layered morphology;

[0032] (2) Fix the template of the above-mentioned ordered pattern on the rotatable substrate holder 5, and then seal the substrate holder 5 in a suitable position in the high vacuum deposition chamber 8;

[0033] (3) Utilize pumping system Rhodes pump 9 and molecular pump 10 to evacuate, make the vacuum degree of deposition chamber 8 be 7.5 * 1...

Embodiment 3

[0035] Example 3 A method for preparing an ordered array of nanoparticles with adjustable spacing and configuration, the preparation steps are as follows:

[0036] (1) Dissolve 0.08 g of polystyrene-polyisoprene diblock polymer in 10 g of chloroform to form a final solution with a weight percentage of 1 wt %; spin-coat 25 μl of the final solution at 2800 rpm on the cleaning surface with a micro sampler Place the silicon wafer in a weighing bottle, drop 15ml of chloroform in it, then seal the weighing bottle with aluminum foil to control the evaporation rate and then prepare a template with an ordered porous layered morphology;

[0037] (2) Fix the template of the above-mentioned ordered pattern on the rotatable substrate holder 5, and then seal the substrate holder 5 in a suitable position in the high vacuum deposition chamber 8;

[0038] (3) Utilize pumping system Rhodes pump 9 and molecular pump 10 to evacuate, make the vacuum degree of deposition chamber 8 be 7.5 * 10 -5 P...

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Abstract

A method for preparing an ordered array of nanoparticles with adjustable spacing and configuration, which comprises dissolving a block polymer in a solvent, spin-coating the solution on a substrate (5), and placing it in a weighing bottle to drop Toluene, sealed with aluminum foil or cotton cloth to make an orderly pattern template, fixed on the substrate holder (5), placed in the deposition chamber (8), vacuumized, and filled with inert gas into the condensation chamber (6), by atomic The atomizer (1) produces atomic gas through magnetron sputtering or high-temperature evaporation, and grows into nanoparticles through the condensation of the inert gas in the condensation chamber (6), and forms a highly directional nanoparticle beam (4) through the nozzle (2); The particle beam is deposited on the template substrate, and the deposition is stopped when the coverage is ≤100%, and a linear nanoparticle array or a two-dimensional ordered nanoparticle array can be obtained. The method of the invention has the characteristics of simple process, low cost, high efficiency, easy large-scale production and the like.

Description

1. Technical field [0001] Nanomaterials and nanodevices, bio / chemical sensors 2. Background technology [0002] Nanoparticle arrays have an important application background in nanotechnology, and a variety of preparation methods have been developed internationally. However, there is still a lack of cheap and effective control methods for the preparation of ordered arrays of nanoparticles with diameters below 30 nm. Although the existing photolithography technology can accurately construct ordered arrays of particles on the order of microns and hundreds of nanometers, the photolithography technology is limited by the diffraction of light and is not suitable for preparing structures below 100 nm. Theoretically speaking, electron beam etching technology and ion beam etching technology are also capable of preparing nanostructures of tens of nanometers or even below 10 nm, but electron beam or ion beam etching technology is extremely low in efficiency due to its high cost. The ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B82B3/00
Inventor 时钟涛韩民周剑峰宋凤麒万建国王广厚
Owner NANJING UNIV
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