Novel aluminum emitter junction N type single crystal silicon solar battery
A solar cell, emitter junction technology, used in photovoltaic power generation, circuits, electrical components, etc.
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[0033] (1) The N-type monocrystalline silicon wafer with a resistivity of 0.2-15Ω.cm is subjected to chemical pre-cleaning and textured etching;
[0034] N-type monocrystalline silicon wafers with a resistivity of 0.2-15Ω.cm are placed in 0.5%-2% Na 2 SiO 3 Ultrasonic pre-cleaning in the solution for 5-10 minutes, rinse with deionized water, remove the surface damage layer with heated 20% NaOH or KOH solution, and then add a small amount of alcohol or isopropanol with 1%-2% NaOH or KOH solution The suede surface is corroded, soaked in dilute hydrochloric acid and dilute hydrofluoric acid, rinsed with deionized water, and dried.
[0035] (2) On the front side of the N-type single crystal silicon wafer, phosphorus is diffused N + Layer: N + Layer adopts conventional gas phase carrying POCl 3 Thermal diffusion, silicon wafers are placed back to back in a quartz boat during diffusion, the temperature is 850-920°C, and the sheet resistance is controlled at 20-60Ω / cm 2 .
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