RF micro-inductance with suspending structure and its making method
A technology of suspended structure and manufacturing method, which is applied in the field of microelectronics, can solve the problems that the coupling capacitance between the coil and the substrate cannot be effectively reduced, the micro-plating mold with high aspect ratio cannot be formed, and the working frequency is low, so as to achieve easy mass production, The effect of high inductance and high operating frequency
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0025] The embodiments of the present invention are described in detail below in conjunction with the accompanying drawings: this embodiment is implemented on the premise of the technical solution of the present invention, and detailed implementation methods and specific operating procedures are provided, but the protection scope of the present invention is not limited to the following the described embodiment.
[0026] As shown in Fig. 1 and Fig. 2, this embodiment is composed of double-sided oxidized silicon substrate 1, lead wire 2, metal spiral coil 3, and planar waveguide 6, and planar waveguide 6 and lead wire 2 are arranged on the plane of silicon substrate 1 , the planar waveguide 6 is arranged on both sides around the lead wire 2, and the metal helical coil 3 is arranged above the lead wire 2, and the lead wire 2 is respectively connected with the inner and outer ends of the metal helical coil 3. A support body 4 is arranged between the metal spiral coil 3 and the sil...
PUM
Property | Measurement | Unit |
---|---|---|
Height | aaaaa | aaaaa |
Thickness | aaaaa | aaaaa |
Thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com