Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Nano contact printing

A surface contact, molecular technology, applied in nanotechnology, nanotechnology, nanotechnology for information processing, etc., can solve problems such as large amount of time, and achieve the effect of repeatability improvement

Inactive Publication Date: 2008-07-09
MASSACHUSETTS INST OF TECH
View PDF16 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Thus, these techniques can be used for relatively simple devices, but fabrication of devices with many parts may require an unacceptably large amount of time

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Nano contact printing
  • Nano contact printing
  • Nano contact printing

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0098] Example 1: Preparation of complementary images of DNA monolayers

[0099] a. Preparation of DNA solution

[0100] Before use, wash with 75% H 2 SO 4 and 25% H 2 o 2 solution to clean all glassware. All water used was ultrapure water (18 MΩ / cm).

[0101] The first DNA 5'- / 5-thiol MC6-D / ACG CAA CTT CGG GCT CTT-3' was purchased from Integrated DNA Technologies, Inc. (IDT), Coraville, IA. All DNA strands were used as received from the manufacturer. The primary DNA was dissolved in water at a concentration of 1 μg / mL, divided into smaller aliquots of 50 μL, and stored at -20°C. When using a portion of this solution, it was reduced by placing an aliquot in 40 mM buffer solution (0.17 M sodium phosphate, pH 8) containing dithiothreitol (DTT) for 16 hr. Oligonucleotides and by-products of the DTT reaction were separated using size exclusion chromatography (NAP 10 column from Pharmacia Biotech) according to the manufacturer's instructions. 10 mM sodium phosphate buf...

Embodiment 2

[0110] Example 2: Pattern transfer of gold grid

[0111] AFM calibrated gold grids were soaked for 5 days in a 4 μM solution of the first DNA molecule as described in Example 1 to generate a patterned body. The main body was exposed to 1 mM 6-mercapto-1-hexanol aqueous solution for 2 hr to minimize non-specific adsorption of single-stranded DNA, then rinsed 5 times with water and air-dried. Hybridization occurs by exposing the subject to a 6 μM solution of the second DNA described in Example 1 for 2 hours. The gold on second mica substrate was placed on the body so that the two gold surfaces faced each other with a small amount of water between them. A small mechanical force is applied to push the two substrates together. After about 5 hr, the substrate was soaked in 1M NaCl (70°C) in TE buffer for 20 min. The two substrates (ie, the main body and the complementary image) were automatically separated, rinsed twice with 1 M NaCl in TE buffer and five times with water, and ...

Embodiment 3

[0112] Example 3: Fabrication of DNA chips

[0113] The host was prepared using dip pen nanolithography as described by Demer et al., Angew. Chem. Int. Ed. (2001), 40:307 1-3073, the entire teaching of which is incorporated herein by reference. To prepare the host, the gold surface on the mica substrate was contacted with a 1 mM solution of 1-octadecanethiol (ODT) in ethanol for 5 min to cover the exposed gold surface with ODT molecules. The substrate was then immersed in a 1 mM solution of 1,16-mercaptohexadecanic acid (MHA) and the displacement was bound to the surface using the tip of an atomic force microscope by contacting the surface with a force of about 0.5 nN to create a 100 nm dot. ODT molecules. The MHA in solution binds to the exposed gold surfaces of the dots. Activate MHA with a 10 mg / mL solution of 1-ethyl-3-(3-dimethylaminopropyl)carbodiimide hydrochloride (EDAC) in 0.1 M morpholine / ethanesulfonic acid at pH 4.5 carboxylic acid groups, and then rinsed with...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

A method of stamping of molecular patterns and / or devices based on the reversible self-assembly of molecules is disclosed. In one embodiment, the method for forming complementation map of the main body comprises the steps of; providing main body, which has a first set of molecules compounded into the first base (14) for forming patterns; forming bonds, through which the first set of molecules (12) is assembled with a second set of molecules (16), the second set of molecules (16) having active functional groups (18) and exposed functional groups (28); enabling the active functional groups (18) to be in contact with and react with the surface of a second base (22), a bond being formed between the second set of molecules (16) and the second base (22); enabling the rest exposed surface of the second base (22) to be in contact with another set of molecules (24); destroying the bond between the first set of molecules (12) and the second set of molecules (16), the second set of molecules (16) being bonded to the second base (22) to form the complementation map of the main body (26). The main body may be reused once or for many times to form additional complementation map.

Description

Background of the invention [0001] In recent years, there have been considerable efforts aimed at understanding new phenomena at the nanoscale, and various nanostructured new materials have been fabricated and characterized. New devices with attractive properties have just begun to be designed. Expectations are high for a new generation of inexpensive and innovative tools that will change our lives. Combining a new set of desirable and undesired properties with a whole new family of materials and fabrication methods will enable devices we could not even have imagined just a decade ago. Coulomb blockade of metallic nanoparticles and semiconductor quantum dots, narrow-band fluorescence emission from semiconductor nanoparticles, quantized ballistic conduction of nanowires and nanotubes are just a few of the new developments that will affect the way we design optical and electronic devices. Material / Phenomena. For a review of nanodevices and fabrication techniques, see Bashir, ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): B32B5/02
CPCG03F7/0002B01J19/0046B01J2219/00385B01J2219/00387B01J2219/00497B01J2219/00527B01J2219/00585B01J2219/00596B01J2219/00605B01J2219/00659B01J2219/00677B01J2219/00722B01J2219/00725B01J2219/00729B82Y10/00B82Y30/00B82Y40/00A61L12/08
Inventor F·斯泰拉奇A·A·于
Owner MASSACHUSETTS INST OF TECH
Features
  • Generate Ideas
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com