Nano contact printing

A surface contact, molecular technology, applied in nanotechnology, nanotechnology, nanotechnology for information processing, etc., can solve problems such as large amount of time, and achieve the effect of repeatability improvement

Inactive Publication Date: 2008-07-09
MASSACHUSETTS INST OF TECH
View PDF16 Cites 3 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Thus, these techniques can be used for relatively simple devices, but fabricat

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Nano contact printing
  • Nano contact printing
  • Nano contact printing

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0098] Example 1: Preparation of complementary images of DNA monolayers

[0099] A. Preparation of DNA solution

[0100] Before use, use 75% H 2 SO 4 And 25% H 2 O 2 The solution cleans all glass instruments. All the water used is ultrapure water (18MΩ / cm).

[0101] The first DNA 5'- / 5-thiol MC6-D / ACG CAA CTT CGG GCT CTT-3' was purchased from Integrated DNA Technologies, Inc. (IDT), Coraville, IA. All DNA strands are used in the state accepted from the manufacturer. The first DNA was dissolved in water at a concentration of 1 μg / mL, divided into smaller aliquots of 50 μL, and stored at -20°C. When a portion of this solution is used, it is reduced by placing an aliquot in a 40 mM buffer solution (0.17 M sodium phosphate, pH 8) containing dithiothreitol (DTT) for 16 hours. According to the manufacturer's instructions, size exclusion chromatography (NAP 10 column from Pharmacia Biotech) was used to separate the oligonucleotides and the by-products of the DTT reaction. A 10 mM sodiu...

Example Embodiment

[0110] Example 2: Pattern transfer of gold grid

[0111] The AFM calibration gold grid was soaked in the 4 μM solution of the first DNA molecule described in Example 1 for 5 days to produce a patterned body. The main body was exposed to a 1 mM 6-mercapto-1-hexanol aqueous solution for 2 hr to minimize non-specific adsorption of single-stranded DNA, and then rinsed with water 5 times and air-dried. The subject was then exposed to the 6 μM solution of the second DNA described in Example 1 for 2 hours, so that hybridization occurred. Place the gold substrate on the second mica on the main body so that the two gold surfaces face each other with a small amount of water between them. A small mechanical force is applied to push the two substrates together. After about 5 hours, the substrate was soaked in 1M NaCl (70°C) in TE buffer for 20 minutes. The two substrates (ie, the main body and the complementary image) are automatically separated, rinsed twice with 1M NaCl in TE buffer, and r...

Example Embodiment

[0112] Example 3: DNA chip manufacturing

[0113] As described in Demer et al., Angew. Chem. Int. Ed. (2001), 40:307 1-3073, the main body was prepared using dip pen nanolithography, and the entire teaching of this document is incorporated herein by reference. To prepare the main body, the gold surface on the mica substrate was contacted with a 1 mM solution of 1-octadecanethiol (ODT) in ethanol for 5 minutes to cover the exposed gold surface with ODT molecules. The substrate was then immersed in a 1 mM solution of 1,16-mercaptohexadecanoic acid (MHA), and the tip of the atomic force microscope was used to make the displacement bound to the surface by contacting the surface with a force of about 0.5nN to produce a 100nm dot. ODT molecule. The MHA in the solution binds to the exposed gold surface of the dots. Activate MHA with a 10 mg / mL solution of 1-ethyl-3-(3-dimethylaminopropyl)carbodiimide hydrochloride (EDAC) in 0.1M morpholine / ethanesulfonic acid at pH 4.5 The carboxylic ac...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

A method of stamping of molecular patterns and/or devices based on the reversible self-assembly of molecules is disclosed. In one embodiment, the method for forming complementation map of the main body comprises the steps of; providing main body, which has a first set of molecules compounded into the first base (14) for forming patterns; forming bonds, through which the first set of molecules (12) is assembled with a second set of molecules (16), the second set of molecules (16) having active functional groups (18) and exposed functional groups (28); enabling the active functional groups (18) to be in contact with and react with the surface of a second base (22), a bond being formed between the second set of molecules (16) and the second base (22); enabling the rest exposed surface of the second base (22) to be in contact with another set of molecules (24); destroying the bond between the first set of molecules (12) and the second set of molecules (16), the second set of molecules (16) being bonded to the second base (22) to form the complementation map of the main body (26). The main body may be reused once or for many times to form additional complementation map.

Description

Background of the invention [0001] In recent years, there have been considerable efforts aimed at understanding new phenomena at the nanoscale, and various nanostructured new materials have been fabricated and characterized. New devices with attractive properties have just begun to be designed. Expectations are high for a new generation of inexpensive and innovative tools that will change our lives. Combining a new set of desirable and undesired properties with a whole new family of materials and fabrication methods will enable devices we could not even have imagined just a decade ago. Coulomb blockade of metallic nanoparticles and semiconductor quantum dots, narrow-band fluorescence emission from semiconductor nanoparticles, quantized ballistic conduction of nanowires and nanotubes are just a few of the new developments that will affect the way we design optical and electronic devices. Material / Phenomena. For a review of nanodevices and fabrication techniques, see Bashir, ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): B32B5/02
CPCG03F7/0002B01J19/0046B01J2219/00385B01J2219/00387B01J2219/00497B01J2219/00527B01J2219/00585B01J2219/00596B01J2219/00605B01J2219/00659B01J2219/00677B01J2219/00722B01J2219/00725B01J2219/00729B82Y10/00B82Y30/00B82Y40/00A61L12/08
Inventor F·斯泰拉奇A·A·于
Owner MASSACHUSETTS INST OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products