Method for recovering dichloro-dihydro silicon from off-gas generated from the production of polycrystalline silicon

A technology of dichlorodihydrosilane and polysilicon, applied in separation methods, chemical instruments and methods, silicon, etc., can solve problems such as serious environmental pollution, waste of energy, backward technology, etc., to solve environmental pollution problems, improve product quality, The effect of saving project investment

Active Publication Date: 2009-02-04
CHINA ENFI ENGINEERING CORPORATION
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Problems solved by technology

[0004] my country's polysilicon industry started in the 1950s, realized industrialization in the mid-1960s, and developed blindly in the early 1970s. There were more than 20 production plants, all using traditional Siemens technology, backward technology, serious environmental pollution, and material consumption. Large, high production costs, most enterprises lose money and stop production or change production one after another
[0005] The outstanding feature of the traditional polysilicon production process is the tail gas wet recovery technology, that is, the tail gas in the reduction furnace is initially pressurized to separate chlorosilane and then rinsed with water to recover hydro

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  • Method for recovering dichloro-dihydro silicon from off-gas generated from the production of polycrystalline silicon
  • Method for recovering dichloro-dihydro silicon from off-gas generated from the production of polycrystalline silicon
  • Method for recovering dichloro-dihydro silicon from off-gas generated from the production of polycrystalline silicon

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[0022] Example 1:

[0023] reference figure 1 , Which shows the flow chart of the industrial production of polysilicon that can apply the dichlorodihydrosilicon recovery method according to the embodiment of the present invention. In the prior art, there are many methods for industrialized polysilicon production. The polysilicon of the present invention is applied. The production process uses industrial silicon and hydrogen chloride (HCl) as the main raw materials, and generates trichlorosilane (SiHCl) by controlling the reaction conditions. 3 )-Based mixture of chlorosilane and hydrogen, and then through the existing purification technology to trichlorosilane (SiHCl 3 ) After purification, it is sent to the reduction furnace to make trichlorosilane (SiHCl 3 ) And auxiliary material hydrogen (H 2 ) Reaction and reduction to generate polysilicon.

[0024] In the above-mentioned industrial production of polysilicon, the exhaust gas produced mainly includes hydrogen (H 2 ), hydrogen...

Example Embodiment

[0038] Example 2:

[0039] Reference below image 3 The method for recovering dichlorodihydrosilicon from the tail gas generated in the production of polysilicon according to the second embodiment of the present invention is described. image 3 Shows a flow chart according to the second embodiment of the present invention. The main difference between this embodiment and the above-mentioned first embodiment is that it also includes the use of liquid silicon tetrachloride (SiCl 4 ) The step of rinsing the exhaust gas.

[0040] In the traditional wet exhaust gas treatment process, the exhaust gas is usually rinsed with water. The purpose is to rinse the hydrogen chloride (HCl) in the exhaust gas into the water, and part of the unrecovered chlorosilane is hydrolyzed into the water after being rinsed. Hydrogen chloride and silica hydrate, this type of sewage needs to be treated separately, resulting in high material consumption and serious environmental pollution. At the same time, it al...

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Abstract

A method for recovering dichlordihydrosilicate from tail gas generated from polysilicon production comprises the following steps: the tail gas is leached at low temperature, pressurized and cooled for gas-liquid separation; gaseous hydrogen, hydrogen chloride and the dichlordihydrosilicate pass through a liquid absorbent to cause the gaseous hydrogen chloride and the dichlordihydrosilicate to be dissolved in the liquid absorbent, and the hydrogen is separated from the hydrogen chloride and the dichlordihydrosilicate; the hydrogen chloride and the dichlordihydrosilicate dissolved in the liquid absorbent are desorbed by increasing the temperature; the gas-liquid separation is carried out on the desorbed gaseous hydrogen chloride and the dichlordihydrosilicate by controlling the pressure and/or the temperature, therefore, the hydrogen chloride becomes gaseous and the dichlordihydrosilicate becomes liquid, and then the dichlordihydrosilicate is recovered. By adopting dry processing, the dichlordihydrosilicate in the tail gas is recovered and can be reused in the polysilicon production, therefore, the method has the advantages of adequate utilization of raw materials, reducing pollutants, solving the problem of environmental pollution, improving product quality and lowering cost.

Description

technical field [0001] The invention relates to a method for recovering and treating tail gas produced by industrial production of polysilicon, more specifically, to a method for recovering dichlorodihydrogen silicon from the tail gas produced by producing polysilicon. Background technique [0002] Polycrystalline silicon is the raw material for preparing monocrystalline silicon, which is ultimately used in the production of integrated circuits and electronic devices. It is one of the basic raw materials with the largest consumption and the highest purity requirements in the information industry. It is also a product and industry that the country encourages the development of. [0003] The world's advanced polysilicon production technology has always been monopolized by companies from the United States, Japan, and Germany. Each company has its own technical secrets and technical characteristics. After continuous research and development, it has formed its own production proce...

Claims

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Application Information

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IPC IPC(8): B01D53/00C01B33/107C01B33/03
Inventor 沈祖祥严大洲汤传斌肖荣晖毋克力
Owner CHINA ENFI ENGINEERING CORPORATION
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