Vertical channel organic field effect transistor and method for producing the same
A technology of vertical channels and organic fields, applied in the field of organic electronics, to achieve the effect of reducing difficulty, reducing cost and expanding the scope of application
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Embodiment 1
[0054] Depend on figure 1 As shown, the basic structure of the vertical channel organic field effect transistor of the present invention includes an insulating substrate, a metal gate electrode, a dielectric layer, an insulating layer for isolating source and drain electrodes, a vertical organic semiconductor layer, a planar metal source electrode and a planar metal drain electrode .
[0055] The insulating substrate is the base of this structure, and its manufacturing material is a silicon wafer with insulating films such as silicon oxide and silicon nitride, or insulating glass or insulating plastic film.
[0056] On the upper part of the insulating substrate is the source electrode, and the material of the source electrode can be a high-common function metal material such as gold, platinum or silver, or a conductive organic substance such as PEDOT:PSS. The source electrode is a planar electrode and is tiled on an insulating substrate.
[0057] The central part above the s...
Embodiment 2
[0067] Such as image 3 As shown, the present invention also discloses a method for preparing a vertical channel organic field effect transistor, and its specific preparation steps are as follows:
[0068] see Figure 4 to Figure 12 .
[0069] Step 101: Prepare a planar gold source electrode on a thermally oxidized silicon insulating substrate. The specific preparation method of the planar source electrode used therein adopts the method of vacuum thermophysical deposition, electron beam deposition, sputtering metal electrode, ink-jet printing or spin-coating organic electrode.
[0070] Step 102: Deposit an insulating layer on the source electrode layer. The deposition method for the inorganic insulating layer is low-pressure chemical vapor deposition (LPCVD), sputtering or atomic layer deposition (ALD), etc.; the deposition method for the organic insulating layer is spin coating or inkjet printing. In this embodiment, an electron beam evaporation deposition method is used ...
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