Optical waveguide and its production method and micro-optical gyroscope
An optical waveguide and manufacturing method technology, applied in the directions of optical waveguide, light guide, optics, etc., can solve the problems of inaccurate detection angular velocity, short propagation distance, weak effect, etc., to increase the equivalent length, improve the accuracy, and achieve accurate results. Effect
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Embodiment 1
[0052] This embodiment provides an optical waveguide, which is used in a micro-optical gyroscope as a key component for generating effects. The structure of the optical waveguide is specifically: the optical waveguide adopts a silicon substrate, and a multi-layer spiral waveguide is arranged on the silicon chip , the shape of the helical waveguide distribution in each layer is as follows figure 1 As shown, an isolation layer is provided between each layer of the spiral waveguide in the multi-layer spiral waveguide, and the connection ends of two adjacent layers of the spiral waveguide are connected through a vertical waveguide arranged in the isolation layer between the two layers of spiral waveguides. The multi-layer spiral waveguide is connected in sequence to form an integral spiral waveguide. The overall spiral waveguide is specifically: the bottom spiral waveguide is connected to the top spiral waveguide through the middle layers of spiral waveguides in turn to form an ov...
Embodiment 2
[0054] This embodiment provides a method for manufacturing an optical waveguide, which can be used to prepare the optical waveguide described in Embodiment 1. The method is specifically carried out according to the following steps, including:
[0055] With the silicon wafer as the substrate, the silicon wafer is cleaned by standard semiconductor cleaning process, and a buffer layer is grown on the silicon wafer. Generally, a 500nm thick buffer layer is grown on the silicon wafer by CVD method;
[0056] Prepare the first layer of spiral waveguide: grow the first layer of silicon waveguide layer on the above-mentioned silicon wafer structure (it can be to utilize the CVD method to grow a 10 micron thick silicon waveguide layer on the buffer layer grown on the silicon wafer as the first layer of silicon waveguide Layer), after coating positive photoresist on the first silicon waveguide layer, use a negative plate to form a spiral waveguide pattern by photolithography, and form a s...
Embodiment 3
[0076] This embodiment provides another method for manufacturing an optical waveguide, which can be used to prepare the optical waveguide described in Embodiment 1. The method is specifically carried out according to the following steps, including:
[0077] Prepare a layer of helical waveguide:
[0078] A photosensitive polymer material is coated on the silicon wafer and cured as a waveguide layer, and a helical waveguide layer is formed in the photosensitive polymer material by photobleaching, and a connection is formed at the end of the helical waveguide layer by RIE etching or a transmission gradient mask wedge-shaped structure;
[0079] Prepare the vertical waveguide:
[0080] On the silicon chip structure obtained after forming the spiral waveguide layer, apply a photosensitive polymer material to form an isolation layer, and form a vertical waveguide channel through photobleaching, so that the vertical waveguide channel is connected to the wedge-shaped structure of the ...
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