Germanium-doped directionally solidified casting monocrystalline silicon and preparation method thereof
A technology of directional solidification and monocrystalline silicon, applied in self-solidification, single crystal growth, single crystal growth, etc., can solve the problems of limiting the application of germanium-doped Czochralski silicon single crystal, high cost and energy consumption, and achieve dislocation density Effect of small size, reduced light attenuation, and cost reduction
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Embodiment 1
[0023] Spread the germanium-doped monocrystalline silicon blocks with a thickness of 20 mm and a thickness of 20 mm on the bottom of the crucible, in which the concentration of germanium is 8×10 19 / cm 3 , and then put 3kg of germanium block and 240kg of polysilicon together on the raw material germanium-doped monocrystalline silicon block, and add 20mg of dopant boron to realize furnace loading. The furnace chamber was evacuated, and Ar gas was used as a protective gas. Adjust the position of the heat preservation cover in the furnace and heat it to above 1410°C to heat boron, germanium, polysilicon and the 10mm thick raw material germanium-doped monocrystalline silicon block near the polysilicon, and keep the temperature above 1410°C so that the 10mm thick block near the polysilicon Raw material germanium-doped monocrystalline silicon block, all polycrystalline silicon, germanium and boron are melted into liquid to form silicon melt. Then pour cooling water into the bottom...
Embodiment 2
[0027] First spread the dislocation-free raw material monocrystalline silicon block with a thickness of 10mm to the bottom of the crucible, then place 0.3kg of germanium block and 240kg of polysilicon on the single crystal silicon block, and add 5mg of dopant boron to realize the loading. furnace. The furnace chamber was evacuated, and Ar gas was used as a protective gas. Adjust the position of the heat preservation cover in the furnace and heat it to above 1410°C to heat boron, germanium, polysilicon and the 2mm thick raw material single crystal silicon block close to the polysilicon, and keep the temperature above 1410°C so that the 2mm thick raw material single crystal block close to the polysilicon The chunks of crystalline silicon, all polysilicon, germanium and boron are melted into liquids to form a silicon melt. Then, cool nitrogen gas is introduced into the bottom of the crucible, and the insulation cover in the furnace is raised at a speed of 2mm / min, so that the si...
Embodiment 3
[0030] First spread the dislocation-free raw material monocrystalline silicon block with a thickness of 5mm on the bottom of the crucible, then place 30g of germanium material and 240kg of polycrystalline silicon on the single crystal silicon block, and add 6g of dopant gallium to realize furnace loading . The furnace chamber was evacuated, and Ar gas was used as a protective gas. Adjust the position of the heat preservation cover in the furnace and heat it to above 1410°C, so that gallium, germanium, polysilicon and the 1mm thick raw material single crystal silicon block close to the polysilicon are heated, and the temperature is kept above 1410°C, so that the 1mm thick raw material single crystal block close to the polysilicon The chunks of crystalline silicon, all polysilicon, germanium and boron are melted into liquids to form a silicon melt. Finally, pour cooling water into the bottom of the crucible, and raise the heat preservation cover in the furnace at a speed of 3mm...
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