Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Clean method for preparing electronic grade high-purity copper nitrate solution

A copper nitrate, electronic-grade technology, applied in directions such as copper nitrate, can solve problems such as large consumption of nitric acid and large pollution, and achieve the effects of simple operation, reduction of consumption of nitric acid, and saving of raw materials

Inactive Publication Date: 2010-04-28
广东光华化学厂有限公司
View PDF0 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Aiming at the shortcomings of large consumption of nitric acid and large pollution in the traditional copper nitrate production method, the purpose of the present invention is to provide a clean production method of electronic grade high-purity copper nitrate solution

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] Add 2 kg of dilute nitric acid (concentration: 5 wt %) in advance into a 10 L nitric acid-resistant reactor, and then put 1 kg of electrolytic copper sheet into the reactor. Stirring speed 200rpm, control reaction temperature is 50-60 ℃, react under stirring condition for 4 hours, continuously and slowly inject 40wt% nitric acid 5kg, 25wt% hydrogen peroxide 2.4kg (nitric acid injection speed is about 1L / hr, The hydrogen peroxide injection rate is about 0.6L / hr), and a small amount of waste gas generated by the reaction is absorbed by the alkali solution and then emptied. After the reaction, simple solid-liquid separation is used to adjust the pH of the solution to 1.4-1.6 with dilute nitric acid, and the specific gravity is about 1.45 to obtain about 9L of finished copper nitrate solution with a purity of 99.96% and a concentration of 28.1 wt%.

Embodiment 2

[0026] 20 kg of dilute nitric acid (concentration: 10 wt %) was added in advance in a 100 L nitric acid resistant reaction kettle, and then 10 kg of electrolytic copper sheets were put into the reaction kettle. Stirring speed 250rpm, control reaction temperature is 55-65 ℃, reacted 3 hours under stirring condition, continuously and slowly inject 35wt% nitric acid 57kg, 25wt% hydrogen peroxide 24kg (nitric acid injection speed is about 18L / hr, over 2.5 hours after the start of reaction) The hydrogen peroxide injection rate is about 8L / hr), and a small amount of waste gas generated by the reaction is absorbed by the alkali solution and then emptied. After the reaction, simple solid-liquid separation is used to adjust the pH of the solution to 1.4-1.6 with dilute nitric acid, and the specific gravity is about 1.45 to obtain about 90 L of finished copper nitrate solution with a purity of 99.95% and a concentration of 31.5 wt%.

Embodiment 3

[0028] According to the method and addition ratio of Example 1, but dilute nitric acid is selected 8wt% for use; concentrated nitric acid is selected for use 30wt%; After the reaction, through simple solid-liquid separation, the pH of the solution is adjusted between 1.4-1.6 with dilute nitric acid, and the specific gravity is about 1.45 to obtain about 9L of finished copper nitrate solution with a purity of 99.97% and a concentration of 29.2wt%.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
melting pointaaaaaaaaaa
Login to View More

Abstract

The invention discloses a clean method for preparing an electronic grade high-purity copper nitrate solution. The method comprises the following steps: after injecting dilute nitric acid into a reactor which resists the erosion of nitric acid, putting a superfluous electrolytic metallic copper plate into the reactor, stirring after dissolution reaction began, adding thicker hydrogen peroxide and thicker nitric acid, and carrying out solid-liquid separation after finishing the reaction to obtain the copper nitrate solution. The method has simple operation and no nitrogen oxide pollution.

Description

technical field [0001] The invention relates to a cleaning method for preparing electronic-grade high-purity copper nitrate solution. Background technique [0002] Copper nitrate has a relative density of 2.32 (25°C) and a melting point of 114.5°C. It is easy to deliquescence, very soluble in water and ethanol, and decomposes into copper oxide when heated. There are three types of solid copper nitrate: anhydrous, trihydrate and hexahydrate. Cu(NO 3 ) 2 ·6H 2 O is a blue orthorhombic crystal with a density of 2.074. It loses three molecules of crystal water at 26.4°C to form a trihydrate, which is a dark blue triangular crystal. [0003] Copper nitrate is widely used in copper plating in electroplating industry, and can be used as colorants in enamel industry, photosensitive materials, mordants for textile dyeing, oxidants, aluminum gloss agents, catalysts for promoting organic reactions, medicines, insecticides, etc. The production method of copper nitrate mainly contai...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C01G3/08
Inventor 谭泽王刊周一朗陈旭波
Owner 广东光华化学厂有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com