Gas purification method

A refining method and gas technology, applied in separation methods, gas treatment, chemical instruments and methods, etc., and can solve problems such as non-disclosure

Inactive Publication Date: 2013-11-06
NIPPON SANSO CORP +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0013] However, the inventions exemplified in the above-mentioned patent documents all have the volume concentration of impurities contained in the gas to be purified at the % level, and there is no disclosure that the purification of the impurity volume concentration at the ppm level can be performed.

Method used

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Examples

Experimental program
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Effect test

Embodiment 1

[0054] (Example 1) Gas purification containing high-concentration impurities

[0055] In Example 1, using figure 1 The carbon membrane module shown is used for the purification of gases containing high concentrations of impurities. The specifications of carbon membrane modules are as follows. Outer diameter of hollow filamentary carbon membrane tube: 0.525mm, length of hollow filamentary carbon membrane tube: 85mm, number of hollow filamentary carbon membrane tubes: 13, total surface area of ​​hollow filamentary carbon membrane tube: 18.22cm 2 . The hollow-fiber carbon membrane is produced by forming and carbonizing an organic polymer membrane made of polyimide (aromatic polyimide) as a raw material.

[0056] The carbon membrane module was maintained at 25°C, and the supply gas pressure was set to 0.5 MPaG with a back pressure regulator at the non-permeated gas outlet.

[0057] (a) A gas mixed with 500 sccm of ammonia gas and 500 sccm of impurity hydrogen was supplied to t...

Embodiment 2

[0064] (Example 2) Gas purification containing low-concentration impurities

[0065] In Example 2, using figure 1 The carbon membrane module shown, refines a gas containing low levels of impurities. The specifications of carbon membrane modules are as follows. Outer diameter of hollow filamentary carbon membrane tube: 0.39mm, length of hollow filamentary carbon membrane tube: 117mm, quantity of hollow filamentary carbon membrane tube: 38 pieces, total surface area of ​​hollow filamentary carbon membrane tube: 54.9cm 2 . The hollow-fiber carbon membrane is produced by forming an organic polymer membrane made of polyphenylene oxide (PPO) and carbonizing it after heat treatment.

[0066] The carbon membrane module was maintained at 70°C, and the supply gas pressure was set to 0.45 MPaG with a back pressure regulator at the non-permeated gas outlet.

[0067] (a) A gas containing 50 sccm of impurity hydrogen (14390 ppb) / helium mixed with 450 sccm of ammonia gas was supplied to ...

Embodiment 3

[0075] (Example 3) Gas purification containing low-concentration impurities

[0076] In Example 3, using figure 1 The carbon membrane module shown, refines a gas containing low levels of impurities. The specifications of carbon membrane modules are as follows. Outer diameter of hollow filamentary carbon membrane tube: 0.20mm, length of hollow filamentary carbon membrane tube: 120mm, quantity of hollow filamentary carbon membrane tube: 100 pieces, total surface area of ​​hollow filamentary carbon membrane tube: 76.9cm 2 . The hollow-fiber carbon membrane is produced by forming an organic polymer membrane made of polyphenylene oxide (PPO) and carbonizing it after heat treatment.

[0077] The carbon membrane module was maintained at 30°C, and the supply gas pressure was set to 0.45 MPaG with a back pressure regulator at the non-permeated gas outlet.

[0078] A gas mixed with 200 sccm of hydrogen (9550 ppb), nitrogen (9700 ppb), methane (9200 ppb), carbon monoxide (9380 ppb) / h...

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Abstract

A gas purification method of the present invention uses a carbon membrane having a molecular sieving action to purify at least one selected from the group consisting of a hydride gas, a hydrogen halide gas, and a halogen gas, each gas containing an impurity at 10 ppm or less. The present invention can be used for a recovery unit that recoveries a used gas to reuse it as an ultrapure semiconductor material gas, and a unit or equipment that produces or charges an ultrapure semiconductor material gas.

Description

technical field [0001] The present invention relates to a gas purification method, in particular to a gas purification method for refining silane, phosphine and other gases used as semiconductor materials by using a carbon film with molecular sieve function. [0002] This application claims priority based on Japanese Patent Application No. 2007-266495 filed on October 12, 2007 and Japanese Patent Application No. 2008-238357 filed on September 17, 2008 in Japan, and the contents thereof are incorporated herein. Background technique [0003] At present, it is more desirable to use an ultra-high purity gas with an impurity volume concentration of ppt to ppb order as a semiconductor material gas than a high-purity gas with an impurity volume concentration of ppb to ppm order. [0004] Examples of the gas used for the semiconductor material include hydride gases such as ammonia, silane, and phosphine; halide gases such as hydrogen fluoride, hydrogen chloride, and hydrogen bromide...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01D53/22B01D69/04B01D69/08B01D71/02C01B7/00C01C1/02
CPCC01B3/503B01D53/228C01B7/00C01B2210/0045B01D2257/20B01D71/021C01B2210/0051C01B2210/0062Y02E60/364B01D63/02B01D53/22B01D2258/0216C01C1/024C01B3/04C01B2203/0405Y02E60/36B01D69/04B01D69/08B01D63/06
Inventor 宫泽让小林芳彦原谷贤治吉宗美纪
Owner NIPPON SANSO CORP
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