Bottom electrode bottom-removing etching method of space three-junction gallium arsenide solar battery
A technology of solar cells and gallium arsenide, which is applied in circuits, electrical components, sustainable manufacturing/processing, etc., can solve the problem of inability to ensure that there will be no reverse Ge junctions on the back surface of epitaxial wafers, and the surface morphology of cells cannot be controlled. Reduce battery output voltage and other issues to achieve the effect of promoting wide application, improving surface appearance, and improving conversion efficiency
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[0018] The present invention will be further described in detail below through the specific examples, the following examples are only descriptive, not restrictive, and cannot limit the protection scope of the present invention with this.
[0019] A bottom-etching method for a lower electrode of a triple-junction gallium arsenide solar cell for space, the steps are:
[0020] (1) Coat the front of the wafer with photoresist, the speed is 1000r / min~3000r / min, the time is 8s~20s, and then put the flower into the drying box, the temperature is controlled at 85℃~110℃, and the baking time is 10min±1min .
[0021] (2) Prepare the main corrosion solution: hydrogen peroxide: hydrofluoric acid: deionized water = 1:1:8 (volume ratio). Frequency of use of the main etchant: replace at least once every 10 batches of wafers that have been etched cumulatively, and use at most one shift.
[0022] Prepare 201 corrosion solution: hydrogen peroxide: ammonia water: EDTA saturated aqueous solution...
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