Bottom electrode bottom-removing etching method of space three-junction gallium arsenide solar battery

A technology of solar cells and gallium arsenide, which is applied in circuits, electrical components, sustainable manufacturing/processing, etc., can solve the problem of inability to ensure that there will be no reverse Ge junctions on the back surface of epitaxial wafers, and the surface morphology of cells cannot be controlled. Reduce battery output voltage and other issues to achieve the effect of promoting wide application, improving surface appearance, and improving conversion efficiency

Inactive Publication Date: 2010-11-24
CHINA ELECTRONIC TECH GRP CORP NO 18 RES INST
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Problems solved by technology

[0007] The deficiencies in the existing methods are: (1) after a long period of corrosion, the surface morphology of the battery cannot be controlled, which directly affects the firmness of the next evaporation of the lower electrode; (2) the corrosion rate is not fixed, and the epitaxy cannot be guaranteed. There is no reverse Ge junction on the back surface of the sheet, resulting in a decrease in the output voltage of the battery and a decrease in the conversion efficiency of the battery

Method used

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Embodiment Construction

[0018] The present invention will be further described in detail below through the specific examples, the following examples are only descriptive, not restrictive, and cannot limit the protection scope of the present invention with this.

[0019] A bottom-etching method for a lower electrode of a triple-junction gallium arsenide solar cell for space, the steps are:

[0020] (1) Coat the front of the wafer with photoresist, the speed is 1000r / min~3000r / min, the time is 8s~20s, and then put the flower into the drying box, the temperature is controlled at 85℃~110℃, and the baking time is 10min±1min .

[0021] (2) Prepare the main corrosion solution: hydrogen peroxide: hydrofluoric acid: deionized water = 1:1:8 (volume ratio). Frequency of use of the main etchant: replace at least once every 10 batches of wafers that have been etched cumulatively, and use at most one shift.

[0022] Prepare 201 corrosion solution: hydrogen peroxide: ammonia water: EDTA saturated aqueous solution...

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Abstract

The invention relates to a bottom electrode bottom-removing etching method of a space three-junction gallium arsenide solar battery, comprising the following steps of: (1) spreading rubber and drying; (2) configuring main etching liquid and 201 etching liquid; (3) etching and washing wafers, wherein the etching time of the wafers which are put into the main etching liquid is 30-40s; (4) cleaning an organic solvent, wherein in the step (2), the peroxide, the hydrofluoric acid and the deionized water in the main etching liquid are in the volume proportion: of 1:1:8; washing the wafers 4-6 times by using the deionized water, then, putting the wafers into the 201 etching liquid to etch for 10-20s; and finally, taking the wafers out of the etching liquid and washing the wafers 6-10 times by using the deionized water. The invention has simple technology and scientific design, adopts a bottom electrode etching technology to increase the yield of bulk batteries, bottom electrode firmness of batteries and battery performance, and promotes the wide application of three-junction solar batteries in the field of new environment-friendly energy resources.

Description

technical field [0001] The invention belongs to the technical field of solar cell manufacturing, in particular to a method for removing the bottom electrode of a triple-junction gallium arsenide solar cell for space use. Background technique [0002] A solar cell is a semiconductor device that directly converts solar energy into electrical energy based on the photovoltaic effect. The triple-junction gallium arsenide solar cell for space is based on the gallium arsenide / germanium single-junction solar cell, adding a top cell (GaInP 2 ), while preparing a p / n junction in the germanium substrate. It uses metal organic chemical vapor deposition (MOCVD) technology to grow the cell structure on Ge substrates, and uses other corresponding semiconductor process technologies to prepare ohmic contacts and optical anti-reflection films. [0003] Epitaxy is the first step in the preparation of triple-junction solar cells, and the corresponding cell structure is grown on a Ge substrate...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/18H01L31/0224
CPCY02P70/50
Inventor 肖志斌
Owner CHINA ELECTRONIC TECH GRP CORP NO 18 RES INST
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