Manufacturing method of dye-sensitized solar cell
A solar cell and dye sensitization technology, applied in the field of dye-sensitized solar cells and their manufacturing, to achieve the effects of easy fabrication and high power extraction efficiency
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Embodiment 1
[0101] Titanium oxide paste (1 layer of HT paste, 5 layers of D paste, manufactured by Solaronics Co., Ltd.) was coated on a glass substrate with a thickness of 20 μm, and fired at 500° C. for 30 minutes to form titanium oxide (titanium oxide layer, porous semiconductor layer) . On the titanium oxide surface of the sintered substrate, tetrapod crystals of zinc oxide (trade name Panatetra, maximum size range 2 to 20 μm: manufactured by Matsushita Electric Works) were dispersed by the electron spray method. Thereafter, a Ti film (Ti layer) (film thickness: 300 nm) was formed by sputtering. Rinse with dilute hydrochloric acid to remove residual tetraneedle crystals. Thus, a porous Ti layer was produced.
[0102] Next, the substrate on which the Ti layer was formed was immersed (20 hours) in a 0.05 wt % dye solution (black dye, manufactured by Soralonics, acetonitrile:tert-butanol=1:1).
[0103] As the counter electrode, fluorine-doped tin oxide glass (manufactured by Solaronic...
Embodiment 2
[0106] Instead of directly using tetrapod crystals of zinc oxide (trade name Pana Tetra: Panasonic Electric Works), pulverize tetrapod crystals of zinc oxide (Pana Tetra: manufactured by Panasonic Electric Works Co., Ltd.), use needle-shaped zinc oxide crystals, and use The same method as in Example 1 was used to manufacture 5mm square and 50mm square batteries.
[0107] When the characteristics of the fabricated 5 mm square solar cell were evaluated in the same manner as in Example 1, an efficiency of 10.7% was obtained. In addition, the efficiency of the produced 50mm square is 8%, and even if the area is increased, the performance drops very little.
Embodiment 3
[0112] Titanium oxide slurry (P25, water / ethanol mixed solvent) with a thickness of 10 μm was coated on a PET substrate (thickness 1 mm), and heated at 150° C. for 30 minutes to form titanium oxide (titanium oxide layer, porous semiconductor layer). On this substrate, tetrapod crystals of zinc oxide (trade name Panatetra, maximum size range 2 to 20 μm, manufactured by Matsushita Electric Works Co., Ltd.) were dispersed on the surface of titanium oxide by the electron spray method. Thereafter, a Ti film (film thickness: 300 nm) was formed by sputtering. Rinse with dilute hydrochloric acid to remove residual zinc oxide balls. Thus, a porous Ti layer was produced.
[0113] Next, the substrate on which the Ti layer was formed was immersed (20 hours) in a 0.05 wt % dye solution (black dye, manufactured by Soralonics, acetonitrile:tert-butanol=1:1).
[0114] A platinum sputtered titanium plate (manufactured by Solaronics) was used as the counter electrode. The substrate on which ...
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