Vacuum ion plating process

An ion coating and process technology, applied in the direction of ion implantation coating, vacuum evaporation coating, metal material coating process, etc., can solve the problems of difficult governance, environmental pollution, large investment, etc., to achieve stable and reliable quality control, eliminate The effect of environmental pollution and low investment cost

Inactive Publication Date: 2012-09-19
许正诚
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] The traditional electroplating process is mainly based on water plating, and water plating will produce waste liquid, waste gas and waste. If the treatment is not good, the discharge will cause environmental pollution, which is not environmentally friendly, and the treatment is difficult and the investment is also large. Therefore, the The process is gradually limited

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] The cobalt-chromium alloy target is selected, and its components are as follows by weight: the content of cobalt is 63%, the content of chromium is 27%, the content of molybdenum is 5.5%, the content of nickel is 2.5%, and the content of iron is 1.75%. The carbon content is 0.25%. The cobalt-chromium alloy target is placed in a vacuum furnace. The target can be designed as a planar target. The target current is 35A. The power supply is an intermediate frequency power supply or a DC power supply. The voltage is 200V, the duty cycle of the pulse bias is 90%, the reaction gas is argon, and the argon is a protective gas to prevent the oxidation reaction of the alloy from affecting the coating quality. The gas discharge is used to evaporate the target material and ionize both the evaporated material and the gas, and the accelerated effect of the electric field is used to deposit the evaporated material and its reaction product on the workpiece to form a coating. Using the a...

Embodiment 2

[0022] The cobalt-chromium alloy target is selected, and its components are as follows in weight ratio: the content of cobalt is 60%, the content of chromium is 30%, the content of molybdenum is 6%, the content of nickel is 2%, the content of iron is 1.7%, The carbon content is 0.3%. The cobalt-chromium alloy target is placed in a vacuum furnace, the target can be designed as an arc source target, the target current is 90A, the power supply is an inverter power supply or a DC power supply, the vacuum degree in the vacuum furnace is required to be 0.8Pa, and the temperature is 270°C. The pulse bias voltage is 180V, the duty cycle of the pulse bias voltage is 80%, the reaction gas is argon, and the argon is a protective gas to prevent the oxidation reaction of the alloy from affecting the coating quality. The gas discharge is used to evaporate the target material and ionize both the evaporated material and the gas, and the accelerated effect of the electric field is used to depo...

Embodiment 3

[0024] The cobalt-chromium alloy target is selected, and its components are as follows in weight ratio: the content of cobalt is 65%, the content of chromium is 30%, the content of molybdenum is 4%, the content of nickel is 0.6%, the content of iron is 0.3%, The carbon content is 0.1%. The cobalt-chromium alloy target is placed in a vacuum furnace, the target can be designed as a cylindrical target, the target current is 40A, the power supply is an intermediate frequency power supply or DC power supply, the vacuum degree in the vacuum furnace is required to be 0.6Pa, the temperature is The voltage is 150V, the duty cycle of the pulse bias is 65%, the reaction gas is argon, and the argon is a protective gas to prevent the oxidation reaction of the alloy from affecting the coating quality. The gas discharge is used to evaporate the target material and ionize both the evaporated material and the gas, and the accelerated effect of the electric field is used to deposit the evaporat...

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Abstract

The invention relates to the technical field of electroplating, in particular to a vacuum ion plating process. The vacuum ion plating process is characterized in that cobalt-chromium alloy is selected as a target material and the plating process is completed in a vacuum environment, wherein the vacuum degree of the vacuum environment is required to be 0.2-0.9Pa, the temperature is 0-300 DEG C, the target current is 0-100A, the pulse bias voltage is 0-200V, and a reactant gas is argon; and the cobalt-chromium alloy target material is composed of the following components by weight percent: 40-85% of cobalt, 10-55% of chromium and the balance of trace element, wherein the trace element is one or more of molybdenum, nickel, iron, carbon, manganese, silicon, nitrogen, titanium, copper, aluminum and vanadium. The vacuum ion plating process is simple, scientific and reasonable, and is easy and convenient to operate, thus greatly improving the operation ratio and the maneuverability of the vacuum ion plating, catering to production of novel materials, and ensuring that the product surfaces are of bright platinum; and in addition, the investment cost is low, the coating film is even in color and luster, high in surface hardness, good in wearing resistance, and excellent in inoxidizability.

Description

technical field [0001] The invention relates to the technical field of electroplating, in particular to a vacuum ion plating process. Background technique [0002] The traditional electroplating process is mainly based on water plating, and water plating will produce waste liquid, waste gas and waste. If the treatment is not good, the discharge will cause environmental pollution, not environmentally friendly, and the treatment is difficult and the investment is also large. Therefore, the The process is gradually restricted. [0003] Subsequently, physical vapor deposition (PVD) technology appeared, mainly for surface treatment in a vacuum environment. Physical vapor deposition itself is divided into three types: vacuum evaporation coating, vacuum sputtering coating and vacuum ion coating, especially vacuum ion coating. It has developed the fastest in ten years and has become one of the most advanced surface treatment methods today. The principle of vacuum ion coating is t...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/32C23C14/14
Inventor 许正诚
Owner 许正诚
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