Method for preparing cobalt titanate film by dual-target magnetron sputtering method

A technology of magnetron sputtering and cobalt titanate, which is applied in sputtering plating, chemical instruments and methods, ion implantation plating, etc., can solve the problems of large band gap and limited use range, and achieve easy cost, Good prospects for industrial development and easy operation

Inactive Publication Date: 2011-05-04
SHAANXI UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to TiO 2 The bandgap width is large, and it can only catalyze the degradation of organic matter under ultraviolet light, which greatly limits the s...

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] 1) Separately analyze the pure TiO 2 and analytically pure Co 2 o 3 Mix and granulate with binder, then pre-fire at 50MPa at 700°C to prepare TiO 2 Target and Co 2 o 3 target, and then put them into the two radio frequency target positions of the magnetron sputtering apparatus;

[0020] 2) Put the substrate to be coated into a mixed solution of acetone and ethanol with a volume ratio of 1:3, and ultrasonically clean it at an ultrasonic power of 50W, rinse the cleaned substrate with deionized water, and dry it with nitrogen for later use;

[0021] 3) Put the substrate processed in step 2) on the coating sample stage of the magnetron sputtering apparatus, and vacuum the coating chamber and the sample chamber through the vacuum system. When the vacuum degree reaches 1.0×10 -4 At Pa, start the RF target preheating device to preheat for 10 minutes;

[0022] 4) Set the heating temperature of the substrate to 600° C., pass Ar gas into the coating chamber, control the flo...

Embodiment 2

[0026] 1) Separately analyze the pure TiO 2 and analytically pure Co 2 o 3 Mix and granulate with binder, then pre-fire at 100MPa at 200°C to prepare TiO 2 Target and Co 2 o 3 target, and then put them into the two radio frequency target positions of the magnetron sputtering apparatus;

[0027] 2) Put the substrate to be coated into a mixed solution of acetone and ethanol with a volume ratio of 1:8, and ultrasonically clean it at an ultrasonic power of 50W, rinse the cleaned substrate with deionized water, and dry it with nitrogen for later use;

[0028] 3) Put the substrate processed in step 2) on the coating sample stage of the magnetron sputtering instrument, and vacuum the coating chamber and the sample chamber through the vacuum system. When the vacuum degree reaches 9.9×10 -4 At Pa, start the RF target preheating device to preheat for 10 minutes;

[0029] 4) Set the heating temperature of the substrate to 100°C, feed Ar gas into the coating chamber, control the flo...

Embodiment 3

[0033] 1) Separately analyze the pure TiO 2 and analytically pure Co 2 o 3 Mix and granulate with binder, then pre-fire at 500°C at 70MPa to prepare TiO 2 Target and Co 2 o 3 target, and then put them into the two radio frequency target positions of the magnetron sputtering apparatus;

[0034] 2) Put the substrate to be coated into a mixed solution of acetone and ethanol with a volume ratio of 1:4, and ultrasonically clean it at an ultrasonic power of 50W, rinse the cleaned substrate with deionized water, and dry it with nitrogen for later use;

[0035] 3) Put the substrate processed in step 2) on the coating sample stage of the magnetron sputtering instrument, and vacuum the coating chamber and the sample chamber through the vacuum system. When the vacuum degree reaches 9.9×10 -4 At Pa, start the RF target preheating device to preheat for 10 minutes;

[0036] 4) Set the heating temperature of the substrate to 300° C., pass Ar gas into the coating chamber, control the fl...

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PUM

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Abstract

The invention discloses a method for preparing a cobalt titanate film by a dual-target magnetron sputtering method. The method comprises the following steps: granulating TiO2 and Co2O3 respectively, and pre-sintering to prepare TiO2 target and Co2O3 target; placing the TiO2 target and Co2O3 target in two radio frequency targets of a magnetron sputtering device respectively; putting a substrate in the mixture solution of acetone and ethanol, and carrying out ultrasonic cleaning for later use; placing the processed substrate on a film coating sample table of the magnetron sputtering device; vacuumizing a film coating chamber and a sample chamber; setting the substrate heating temperature between 100 and 600 DEG C; introducing Ar gas into the film coating chamber to back-sputters the surface of the substrate; upon the back-sputtering, applying radio frequency sputtering power and starting to coat a film on the substrate; and after finishing the film coating, closing the vacuum system and the main power to obtain the product cobalt titanate film when the temperature in the film coating chamber is reduced to the room temperature. In the invention, two targets are made from oxides of titanium and cobalt respectively, and the CoTiO3 film is synthesized by radio frequency magnetron sputtering in the condition of heating the substrate. The method has the advantages of readily available raw materials and high reaction efficiency; and the prepared film has the advantages of strong adhesion and high durability and stability.

Description

technical field [0001] The invention belongs to a method for preparing a cobalt titanate thin film, in particular to a method for preparing a cobalt titanate thin film by double-target magnetron sputtering without heat treatment. Background technique [0002] As a semiconductor material, perovskite cobalt titanate can be widely used in electronic components, electroplating, sensitive probes, catalysts and other fields. Cobalt titanate film is an inorganic pigment with excellent performance. It has strong impact resistance and adhesion characteristics. The coating with nano-scale particle size has better symmetry, is not easy to fall off, and is more resistant to friction. When used in ceramic glazes, it can improve the surface strength of ceramics according to the characteristics of the ceramic body, reduce the sintering temperature, achieve a good gloss effect, and remove dirt from the surface more quickly [Peng Zifei, Yu Xiafei. Nano-cobalt Application and Prospect of Ser...

Claims

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Application Information

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IPC IPC(8): C23C14/06C23C14/35C30B25/06C30B29/32
Inventor 卢靖黄剑锋曹丽云吴建鹏赵东辉
Owner SHAANXI UNIV OF SCI & TECH
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