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Method for producing molybdenum alloy sputtering target for flat-panel display by using hot isostatic press

A technology of flat panel display and hot isostatic pressing, applied in sputtering coating, metal material coating process, ion implantation plating, etc. It can achieve the effects of increased strength and toughness, high density, and low processing loss.

Active Publication Date: 2012-01-18
GEMCH MATERIAL TECH SUZHOU
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0015] The production of metal molybdenum targets by the usual hot isostatic pressing method has certain defects. For example, when producing large-scale molybdenum-niobium alloy targets, it is difficult to form a cold isostatic pressing target with a large size and no defects at one time by cold isostatic pressing. The target body, especially when the target body after cold isostatic pressing is put into the bag and the bag is stored, the target body is easily broken during transportation and installation, which affects the subsequent thermostatic pressure. Pressed product quality
The finished target ingots produced by conventional hot isostatic pressing often have a large amount of deformation, resulting in a significant drop in the processing yield and affecting the cost of the final product

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0038] Target production steps include:

[0039] 1) Powder preparation; the purity of low oxygen content is not lower than 3N5 metal molybdenum powder and the purity of low oxygen content is not lower than 4N metal niobium powder or metal tantalum powder for mixing and granulation, and the average particle size (D50 ) is about 250 mesh, and the metal molybdenum-niobium or metal tantalum mixed powder is concentrated, in order to prevent oxidation during the powder mixing process, an inert gas is filled in the mixer for protection, generally argon;

[0040] 2) Hydraulic forming: put the prepared powder into the special mold of the hydraulic press, press the powder into the required size through hydraulic pressure, and the density of the target embryo body after hydroforming is not less than 40%;

[0041]3) Cold isostatic pressing (CIP) molding; put the hydroformed target blank into a plastic mold and vacuumize it, then put it into a cold isostatic pressing device for molding. Th...

Embodiment 2

[0049] Finished product size 1100×140×6mm, 90:10wt%MoNb target preparation;

[0050] 1) Powder preparation: pass the raw materials 3N5 metal molybdenum and 4N metal niobium through a 250-mesh sieve respectively, put the sieved metal molybdenum powder and metal niobium powder into the mixer and mix them with argon gas. The mixing time is 2 Hour.

[0051] 2) Hydraulic forming; put the mixed metal molybdenum and niobium powder into a stainless steel mold, the hydraulic pressure is 1000 tons, and the pressure is maintained for 5 minutes and then withdrawn; the length, width and height of the hydraulic target blank are 220×130×110mm, and the cold The relative density of the pressed green body is 55%.

[0052] 3) Cold isostatic pressing: Vacuum-pack the hydroformed metal molybdenum-niobium target blank and put it into a cold isostatic pressing machine. The pressure of cold isostatic pressing is 200Mpa, pressurize at 10Mpa per minute, and wait until 200Mpa After holding the pressur...

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Abstract

The invention relates to a method for producing a molybdenum alloy sputtering target for a flat-panel display by using hot isostatic press. A target material green body is subjected to hydraulic pressure, isostatic cool press and hot isostatic press treatment with the pressure of 100-200 MPa; on the basis of increased density, the fine and uniform grain size can be obtained; and both the intensity and the toughness are increased. Under the co-action of high temperature and high pressure, a processed work piece is equally stressed in all directions; and the target has the characteristics of high density, good uniformity, excellent performance, short production period, less process, low energy consumption, low consumption of a post-processing material and the like.

Description

technical field [0001] The invention relates to related technologies such as the coating of materials by metal materials for international classification C23C, the general coating of sputtering, and the like, in particular a method for producing molybdenum alloy sputtering targets for flat panel displays using hot isostatic pressing technology. Background technique [0002] At present, flat panel display (FPD) including liquid crystal display TFT-LCD, plasma display PDP and touch screen TP has become the mainstream of display, and has been more and more used in various aspects of our lives. In the existing flat panel display industry, metal chromium is mainly used to form films by magnetron sputtering to prepare wires and isolation films. However, because metal chromium is harmful to the environment and human body, it is facing to be replaced by metal molybdenum, etc. The requirement to gradually reduce and limit the use of metal chromium, even so, due to metal molybdenum an...

Claims

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Application Information

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IPC IPC(8): C23C14/34C23C14/14B22F3/12
Inventor 庄志杰
Owner GEMCH MATERIAL TECH SUZHOU
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