High-temperature solar selective absorption coating and preparation method thereof
A solar energy absorption and selective technology, applied in solar thermal power generation, coatings, solar thermal devices, etc., can solve the problems of being unsuitable for use in high temperature conditions and the increase in the emission ratio of coatings, and achieve good infrared reflectivity and emission ratio. The effect of performance, dense coating, easy preparation process
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Embodiment 1
[0038] use figure 2 The magnetron sputtering coating machine sputters Cu / NiCrAlY-AlN / SiAl-O high temperature solar selective absorption coating, target 5 is Cu target, target 6 is NiCrAlY alloy target, target 7 is pure Al target, target 8 is SiAl Target (Al content is 10% by weight), the preparation method is as follows:
[0039] Deposit metal bottom layer: After the vacuum degree of the vacuum chamber reaches the requirement, fill it with argon gas of 40 sccm to keep the pressure of the vacuum chamber at 0.4Pa, open the Cu target, and the sputtering power is 10kW, and stop when the thickness reaches 300nm;
[0040] Absorbing layer deposition: fill 40sccm argon and 48sccm nitrogen through the intake pipe, turn on the NiCrAlY target and the Al target, the NiCrAlY target power is 4kW, the Al target power is 6kW, and stop when the thickness reaches 74nm, as the first absorption layer; The NiCrAlY target power is reduced to 2.5kW, the nitrogen gas is reduced to 42sccm, and the d...
Embodiment 2
[0046] use figure 2 The magnetron sputtering coating machine sputters Cu / NiCrAlY-AlN / AlN high-temperature solar energy selective absorption coating, the target 5 is a Cu target, the target 6 is a NiCrAlY alloy target, and the target 7 is a pure Al target. The preparation method is as follows:
[0047] Deposit the metal bottom layer: After the vacuum degree of the vacuum chamber reaches the requirement, fill it with 40 sccm of argon gas to keep the pressure of the vacuum chamber at 0.4Pa, open the Cu target, and the sputtering power is 10kW, and stop when the thickness reaches 400nm;
[0048] Absorbing layer deposition: fill 40sccm argon and 47sccm nitrogen through the intake pipe, turn on the NiCrAlY target and the Al target, the NiCrAlY target power is 3.8kW, the Al target power is 6kW, and the deposition stops when the thickness is 52nm, as the first absorption layer; Reduce the power of the NiCrAlY target to 2.8kW, reduce the nitrogen gas to 44sccm, and stop when the thick...
Embodiment 3
[0053] use figure 2 The magnetron sputtering coater sputters Cu / NiCrAlY-SiAlN / SiAlO high-temperature solar energy selective absorption coating, the target 5 is a Cu target, the target 6 is a NiCrAlY alloy target, and the target 7 is a SiAl target (the Al content is 18% by weight) The preparation method is as follows:
[0054] Deposit metal bottom layer: After the vacuum degree of the vacuum chamber reaches the requirement, fill it with 40sccm of argon gas to keep the pressure of the vacuum chamber at 0.4Pa, turn on the Cu target, and the sputtering power is 10kW, and stop when the thickness reaches 450nm;
[0055] Deposition of the absorbing layer: fill in 40sccm argon and 54sccm nitrogen through the intake pipe, turn on the NiCrAlY target and the SiAl target, the power of the NiCrAlY target is 4.5kW, and the power of the SiAl target is 6kW, and stop when the thickness reaches 90nm, as the first absorbing layer; Reduce the power of the NiCrAlY target to 3kW, reduce the nitro...
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