Metal back electrode of flexible film solar cell and preparation method thereof
A metal back electrode and solar cell technology, which is applied in the field of solar cells, can solve the problems of no patent disclosure of light trapping effect, and achieve the effects of improving sunlight utilization, shortening production cycle, and improving cell efficiency
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Embodiment 1
[0019] First, use the polyimide film after ultrasonic cleaning as the flexible substrate, and use the spin coating method to coat a layer of TiO on the polyimide film 2 Particles, TiO 2 The diameter of the particles is between 10 nm and 1 μm. Then, a magnetron sputtering method is used to directly grow an aluminum thin film on the polyimide film coated with microparticles.
[0020] In the above deposition process, the gas pressure is 3-30 mTorr, the radio frequency power is 100-250 W, the argon flow rate is 2-20 sccm, and the deposition temperature is room temperature. The thickness of the aluminum film can be changed by adjusting the deposition time.
[0021] After magnetron sputtering the aluminum film, a metal film with a textured structure can be obtained, which can be used as a back electrode to prepare a thin-film silicon flexible battery.
Embodiment 2
[0023] As in the method for preparing the aluminum film described in Example 1, the aluminum film is prepared by the evaporation method, and the obtained aluminum film also has a texture structure.
Embodiment 3
[0025] First, a sputtering method is used to prepare a ZnO film on a polyimide substrate. The deposition process is: gas pressure 3-30mTorr, radio frequency power 100-250W, argon flow rate 2-20sccm, and deposition temperature at room temperature-200°C. Then, the ZnO thin film is etched by wet chemical method to obtain a suede structure. The concentration of the etching solution used is 0.1-5wt%, and it can be an acidic or alkaline solution. Finally, the aluminum film preparation method described in Examples 1 and 2 is used to obtain a textured aluminum film back electrode.
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