The invention discloses a
light wave conversion-antireflection difunctional
sol material and a preparation method of a thin film thereof. The molecular formula of the disclosed
light wave conversion-antireflection difunctional
sol material is Am,Bn:SiO2; when A is Tb<3+>, B is Zn<2+>, m is more than or equal to 0.2% and less than or equal to 0.6%, n is more than or equal to 0.2% and less than or equal to 0.8%; or B does not exist, m is more than or equal to 0.2% and less than or equal to 0.6%; when A is Eu<3+>, B is Al<3+>, m is more than or equal to 0.1% and less than or equal to 0.5%, and n is equal to 0.4%. The preparation method of the thin film of the
light wave conversion-antireflection difunctional
sol material comprises the steps of adding soluble rare-earth salts and / or soluble
metal salt into a
mixed solution of tetraethoxysilane, absolute ethyl
alcohol and deionized water, and
coating a film on the surface of glass through sol subjected to hydrolytic polycondensation and
ageing by a pulling method, and the dried and annealed wet film has the functions of light wave conversion and antireflection. The effects of light wave conversion and antireflection are achieved by controlling the
refractive index and the thickness of the thin film through the preparation processes of regulating the additive amount of a
solvent of a precursor solution, the varieties and mixing amount of
metal and rear-earth salts, the pulling rate, and the amount of
layers of the film.