507 results about "Silorane Resins" patented technology

Radiation-curable silsesquioxane resin materials are employed for micro- and nanolithography. The resin materials can include a radiation-curable silsesquioxane resin and a photo-initiator having low viscosity. The low viscosity of the liquid system allows imprinting with low pressure and low temperature; e.g. room temperature. The resist's dry etching resistance is increased and the cured film is more easily separated from the mask. Due to its high modulus after cure, the material allows the fabrication of micro- and nano-features having high aspect ratios while providing a high throughput. Various pattern sizes, for example, ranging from tens of microns to as small as a few nanometers, may be achieved with the UV-curable material system.

A hydrophobic coating including solid silsesquioxane silicone resins to increase durability is provided. The hydrophobic coating is any composition that increases the contact angle to a surface, preferably glass. The durability of the hydrophobic coating is preferably increased to one and a half years, more preferably three years.

Cosmetic composition for care and/or makeup, comprising: 1) a liquid fatty phase comprising at least one silicone oil, structured with a gelling system comprising at least one polymer (homopolymer or copolymer) with a weight-average molecular mass ranging from 500 to 500,000, containing at least one moiety comprising: at least one polyorganosiloxane group, composed of 1 to 1000 organosiloxane units in the chain of the moiety or in the form of a graft, and at least two groups capable of establishing hydrogen interactions chosen from among the ester, amide, sulfonamide, carbamate, thiocarbamate, urea, thiourea, oxamido, guanidino, biguanidino groups, and combinations thereof, on condition that at least one of the groups is other than an ester group, the polymer being solid at room temperature and soluble in the liquid fatty phase at a temperature of 25 to 250° C., and 2) at least one film-forming silicone resin, the liguid fatty phase, the gelling system and the film-forming silicone resin forming a physiologically acceptable medium.

Disclosed are coating compositions that include both (a) an alkoxy-functional and/or silanol-functional silicone; and (b) an epoxy-functional silicone. Also disclosed are substrates at least partially coated with a coating deposited from such a composition and methods for coating substrates with such compositions.

Nanoporous silicone resins and silicone resin films having low dielectric constants and a method for preparing such nanoporous silicone resins. The silicone resin comprises the reaction product of a mixture comprising(A) 15-70 mol % of a tetraalkoxysilane described by formula where each R1 is an independently selected alkyl group comprising 1 to about 6 carbon atoms,(B) 12 to 60 mol % of an organosilane described by formula where R4 is selected from the group consisting of alkyl groups comprising 1 to about 6 carbon atoms and phenyl and each X is an independently selected hydrolyzable substituent,(C) 15 to 70 mol % of an organotrialkoxysilane described by formula where R2 is a hydrocarbon group comprising about 8 to 24 carbon atoms or a substituted hydrocarbon group comprising a hydrocarbon chain having about 8 to 24 carbon atoms and each R3 is an independently selected alkyl group comprising 1 to about 6 carbon atoms; in the presence of(D) water,(E) hydrolysis catalyst, and(F) organic solvent for the reaction product.The silicone resin is cured and heated in preferably an inert atmosphere at a temperature sufficient to effect thermolysis of carbon-carbon bonds of the R2 groups thereby forming a nanoporous silicone resin.

A method for hydrolyzing chlorosilanes having at least three chlorine atoms bonded to each silicon atom to form silicone resins. The method comprises adding at least one of hydridotrichlorosilane, tetrachlorosilane, or organotrichlorosilane to a two-phase mixture comprising a non-polar organic solvent, an aqueous phase comprising 0 to about 43 weight percent hydrochloric acid, and a surface active compound selected from the group consisting of alkylsulphonic acid hydrate, alkali metal salt of alkylsulphonic acid, arysulphonic acid hydrate, and alkali metal salt of arylsulphonic acid.

This invention relates to photosensitive silicone resins and resin compositions containing the same. Silicone resins of this invention are characterized by that a triorganosilyl group represented by the following general formula (1)wherein R is a divalent organic group and R' is a divalent group or a direct bond is linked to all or a part of the ends of the backbone of polyorganosilsesquioxanes. Photosensitive resin compositions of this invention are formulated from the aforementioned silicone resins and a photogenerator of acid. The aforementioned silicone resins and photosensitive resin compositions show excellent performance as resist materials for multi-level resist processes and for forming barriers of PDP and, on account of their excellent plasma resistance (resistance to O2-RIE), yield patterns of a high aspect ratio.

A method for preparing a nanoporous silicone resin which can be used to form low dielectric constant films useful for electrical insulating coatings on electronic devices comprising (A) contacting a hydridosilicon containing resin with a 1-alkene comprising about 8 to 28 carbon atoms in the presence of a platinum group metal-containing hydrosilation catalyst effecting formation of an alkylhydridosiloxane resin where at least 5 percent of silicon atoms are substituted with at least one group comprising about 8 to 28 carbon atoms and at least 45 percent of silicon atoms are substituted with at least one hydrogen atom and (B) heating the alkylhydridosiloxane resin of step (A) at a temperature sufficient to effect curing and thermolysis of alkyl groups comprising about 8 to 28 carbon atoms from the silicon atoms thereby forming a nanoporous silicone resin.

The present invention provides an oil in silicone emulsion and an oil in silicone/water in silicone dual emulsion. These emulsions employ a silicone resin as the emulsifying agent, include an effective amount of one or more active ingredients, such as, a sunscreen and/or insect repellent and provide enhanced aesthetics and SPF. Also provided are methods of preparation of the oil in silicone and the oil in silicone/water in silicone dual emulsions, compositions that employ these emulsions, and methods of using the compositions to repel insects from skin and protect skin from exposure to the sun.

Dual-usage aqueous liquid detergent compositions having suds compatability and improved cleaning, said composition containing from about 1% to about 60%, by weight of the composition, of a surfactant system wherein said surfactant system contains at least 35%, by weight of the surfactant system, of alkylethoxysulfate; from 0% to about 10%, by weight of the surfactant system, of nonionic surfactant; from 0% to about 10%, by weight of the surfactant system, of soap; further contains from about 0.001% to about 4.0%, by weight of the composition, of an anti-foam selected from organomodified silicone polymers with aryl or alkylaryl substituents combined with silicone resin and the primary filler is modified silica; and mixtures thereof; and contains from about 0.01% to about 2.5%, by weight of the composition, of a structurant.

Methods of using such detergent compositions for laundering textiles.

The present invention relates to a hydrosilation-curable organopolysiloxane resin composition comprising (A) an organopolysiloxane resin having three or more monovalent unsaturated aliphatic hydrocarbon groups and aromatic hydrocarbon carbon groups, (B) an organosilicon compound having two or more silicon-bonded hydrogen atoms and aromatic hydrocarbon groups, (C) a hydrosilation catalyst, and optionally (D) (d1) a solvent or (d2) a hydrosilation-reactive organosiloxane-based diluent, for optical transmission components, especially for optical transmission components serving as optical communication elements, relates to optical transmission components, represented by optical waveguides, comprisiong a hydrosilation-cured product of the aforementioned organopolysiloxane resin and organosilicon compound, and relates to a process for fabricatiing optical transmission components.

A silicone resin composition for die bonding is provided. The composition includes (A) a straight-chain organopolysiloxane having silicon-bonded alkenyl groups, and with a viscosity of no more than 1,000 mPa·s, (B) a three dimensional network-type organopolysiloxane resin that is either wax-like or solid at 23° C., (C) an organohydrogenpolysiloxane having SiH groups, and (D) a platinum-group metal-based catalyst. The composition produces a cured product with a high hardness, and good heat resistance, transparency, and light transmittance in the low wavelength region.

The invention relates to a pair of soles and particularly relates to a pair of soles of ejection foamed rubber-plastic sports shoes and a manufacturing method of the soles. The pair of soles of the ejection foamed rubber-plastic sports shoes consists of the following raw materials: an ethylene-vinyl acetate copolymer, an ethylene-octene copolymer, a hydrogenated styrene-butadiene-styrene block copolymer, an ethylene propylene diene monomer, polysiloxane resin, talcum powder, stearic acid, zinc stearate, zinc oxide, dicumyl peroxide, azobisformamide and masterbatch. The manufacturing method comprises the steps of: mixing the dicumyl peroxide and an azo foaming agent for later use, mixing other raw materials and then pouring into an internal mixer for first-stage internal mixing, then adding a mixture of the dicumyl peroxide and the azo foaming agent for second-stage internal mixing to obtain an internally mixed mixture, thinning the mixture on a roller machine, conveying the material which is evenly mixed by the roller machine into a granulator for granulation, proportioning aggregates after granulation according to set ratios, injecting the aggregates into a shoe mould by using an injection molding machine for molding, and sizing the molded soles into foamed profile products by using an incubator.

A silicone coating composition comprising (A) a silicone resin resulting from (co)hydrolytic condensation of an alkoxysilane or a partial hydrolytic condensate thereof, (B) an aromatic-free compound for curing the silicone resin, and (C) a solvent remains stable during shelf storage. It is applied and heat cured to a plastic substrate to form a protective coat having a high hardness, mar resistance, adhesion, toughness and crack resistance.

Provided is a non-hydrolytic transparent composite composition having excellent transparency and heat resistance, and a low thermal expansion coefficient. Particularly, the transparent composite composition includes a glass filler dispersed in a crosslinked transparent resin produced by a non-hydrolytic reaction. The non-hydrolytic transparent siloxane resin is a resin having Si—O (siloxane) bonds, a resin having at least one kind of heterometal bonds, including Si—O bonds, or the resin further containing other ingredients. When the transparent siloxane resin produced by a non-hydrolytic reaction forms a composite in combination with the glass filler, the composite realizes high transparency and heat resistance, as well as a low thermal expansion coefficient. Therefore, the transparent composite composition is useful as a substrate for thin film transistor (TFT) devices, display devices and optical devices.

A siloxane resin composition is provided which is superior in pattern processability and yields a cured film with high hardness and excellent abrasion resistance by means of UV curing and thermal curing. The siloxane resin composition includes (A) polysiloxane having a carboxyl group and a radical polymerizable group, (B) a photo-radical polymerization initiator and (C) a compound having a radical polymerizable group and not having a Si—O—Si bond.

A method of forming a resist pattern of high aspect ratio excelling in etching resistance by the use of nanoimprint lithography. The method of forming a resist pattern by nanoimprint lithography comprises the steps of disposing organic layer (4) on support (1); providing resist layer (2) on the organic layer (4) with the use of chemical amplification type negative resist composition containing silsesquioxane resin (A); pressing light transmission allowing mold (3) with partial light shielding portion (5) against the resist layer (2) and thereafter carrying out exposure from the upside of the mold (3); and detaching the mold (3).

A process of styling hair involving applying onto the hair a composition containing: (a) at least one propylphenylsilsesquioxane resin comprising from about 30 to about 50 mole % of propyl siloxy units, based on the total mole % of siloxy units of the resin, and from about 50 to about 70 mole % of phenyl siloxy units, based on the total mole % of siloxy units of the resin; (b) at least one phenylsilsesquioxane resin; (c) at least one volatile solvent; and (d) optionally, at least one cosmetically-acceptable aromatic solvent.

A method of preparing a silicone resin film comprising coating a release liner with a nanomaterial-filled silicone composition comprising (i) a hydrosilylation-curable silicone composition comprising a silicone resin and a photoactivated hydrosilylation catalyst and (ii) a carbon nanomaterial, and exposing the coating to radiation having a wavelength of from 150 to 800 nm at a dosage sufficient to cure the silicone resin; a silicone resin film prepared according to the preceding method; and a nanomaterial-filled silicone composition.

The present invention provides a radiation curing composition comprising (a): a siloxane resin, (b): a photoacid generator or photobase generator, and (c): a solvent capable of dissolving component (a) and containing an aprotic solvent.