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Trichlorosilane synthesis gas dust removal method

A technology of trichlorosilane and synthesis gas, applied in separation methods, silicon halide compounds, chemical instruments and methods, etc., can solve pipeline and/equipment blockage, affect the continuous and safe operation of trichlorosilane synthesis gas dust removal system, etc. problems, to achieve the effect of clean and smooth filter screen, prolong the continuous running time, and solve the effect of strong adhesion

Inactive Publication Date: 2012-09-12
SICHUAN XINGUANG SILICON TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The purpose of the present invention is to overcome the problem existing in the prior art that when the high-concentration slurry is transported and / or processed, the high-concentration slurry is likely to cause blockage to the pipeline and / or equipment, thereby seriously affecting the trichlorosilane syngas dedusting system Insufficiency of continuous and safe operation, providing a dust removal method for trichlorosilane synthesis gas that can be continuously and safely operated

Method used

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  • Trichlorosilane synthesis gas dust removal method
  • Trichlorosilane synthesis gas dust removal method
  • Trichlorosilane synthesis gas dust removal method

Examples

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Effect test

Embodiment 1

[0027] The dedusting method of the trichlorosilane synthesis gas is to react the silicon powder and hydrogen chloride gas in a fluidized bed reactor to obtain the trichlorosilane synthesis gas after rough dust removal and wet spraying treatment, and then carry out the following steps to: which handles:

[0028] (1), mix the waste slag obtained in the coarse dedusting step and the slurry obtained in the wet spraying step (the solid content of the slurry is 17%w, and "%w" in the present invention represents the weight percentage) to obtain a mixed slurry , the solid content of the mixed slurry is 41%w;

[0029] (2) Separating chlorosilanes from the mixed slurry to obtain a filter cake (the solid content of the filter cake is 79.8%w) and chlorosilanes;

[0030] (3), hydrolyzing the filter cake.

[0031] The trichlorosilane synthesis gas is processed through the dust removal method of the trichlorosilane synthesis gas in this example, and the production is continuous and safe, a...

Embodiment 2

[0033] see figure 1 , the dedusting method of trichlorosilane synthesis gas, it comprises the steps:

[0034] (1), coarse dedusting: the trichlorosilane synthesis gas is passed through the first gas-solid separator inlet 101 into the first gas-solid separator 1 for coarse dedusting, and most of the solid particles in the synthesis gas are separated;

[0035] (2), wet spraying: pass the gas after coarse dedusting into the spray tower 2, use the chlorosilane liquid that enters the spray tower 2 through the second input port 203 of the spray liquid to cool down the synthesis gas, Rinse to remove high-boiling impurities in the synthesis gas and solid powders that cannot be completely removed in the gas-solid separator, and the dedusted trichlorosilane synthesis gas is discharged from the gas outlet 201 of the spray tower 2;

[0036] (3), mixed waste residue and slurry: collect the waste residue obtained in the rough dedusting step and the slurry obtained in the wet spraying step ...

Embodiment 3

[0042] see figure 2 , the dedusting method of trichlorosilane synthesis gas, it comprises the steps:

[0043] (1), coarse dedusting: pass the trichlorosilane synthesis gas into the second gas-solid separator 8 through the second gas-solid separator inlet 801, pass through the second gas-solid separator 8 and the first gas-solid separator 1 Coarse dedusting, separating most of the solid particles in the synthesis gas, the working temperature of the first gas-solid separator 1 and the second gas-solid separator 8 is 180°C, and the working pressure is 0.2MPa;

[0044] (2), wet spraying: pass the gas after coarse dedusting into the spray tower 2, use the chlorosilane liquid that enters the spray tower 2 through the second input port 203 of the spray liquid to cool down the synthesis gas, Washing, the washed liquid is then evaporated by the evaporator 3, and the gas phase components enter the spray tower 2 and are washed by the chlorosilane liquid again to remove the high-boiling...

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Abstract

The invention discloses a trichlorosilane synthesis gas dust removal method which comprises steps of coarse dust removal and wet spraying and also comprises the following steps of: (1) mixing waste residues obtained in the step of coarse dust removal and slag slurry obtained in the step of wet spraying to obtain mixed slag slurry; (2) separating chlorosilane from the mixed slag slurry to obtain a filter cake and the chlorosilane; and (3) carrying out hydrolytic treatment on the filter cake. According to the trichlorosilane synthesis gas dust removal method disclosed by the invention, the process flow is simplified; ; the waste residues which are obtained in the step of coarse dust removal of trichlorosilane synthesis gas and contain more coarse particle materials are effectively mixed with the slag slurry obtained in the step of wet spraying and the chlorosilane liquid in the mixed slag slurry is separated by using a liquid-solid filter; the solid-liquid separation is easier to carry out; the filtering accuracy is higher; the blockage of a pipeline and / or equipment, which is caused by the high-concentration slag slurry obtained after the chlorosilane is separated, is also avoided; and the trichlorosilane synthesis gas dust removal can be continuously and safety carried out.

Description

technical field [0001] The invention relates to a treatment method for trichlorosilane synthesis gas, in particular to a dust removal method for trichlorosilane synthesis gas. Background technique [0002] Trichlorosilane is an important raw material for the production of organosilicon, silane coupling agent and preparation of polysilicon. With the continuous development of the photovoltaic market in the past two years, the production of polysilicon has continued to rise, and the demand for trichlorosilane has also risen rapidly. [0003] At present, the production method of trichlorosilane is: silicon powder and hydrogen chloride gas are reacted in a fluidized bed reactor to obtain synthesis gas of trichlorosilane. The composition of the trichlorosilane synthesis gas is very complex, the main components are trichlorosilane, silicon tetrachloride, dichlorodihydrosilane, hydrogen and unreacted hydrogen chloride, metal chlorides (such as aluminum chloride, ferric chloride , f...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/107B01D47/06
Inventor 吴海涛王岭蒲晓东崔萍
Owner SICHUAN XINGUANG SILICON TECH
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