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Covering member and manufacture method thereof

A coated and hard technology, applied in the field of coated parts and its manufacturing, can solve problems such as limitations, inability to play an anti-oxidation effect, and poor anti-oxidation effect

Inactive Publication Date: 2012-10-17
HONG FU JIN PRECISION IND (SHENZHEN) CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, since the hardness of CrN itself is not very high (about 18GPa), its application on tools or molds is limited. In addition, the oxidation resistance of the above-mentioned ZrN or CrN hard film is not good, and it is difficult to coat it on tools. Or the surface of the mold cannot play a good anti-oxidation effect, which will easily lead to the failure of the film

Method used

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  • Covering member and manufacture method thereof
  • Covering member and manufacture method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0058] Plasma cleaning: the argon flow rate is 280 sccm, the bias voltage of the hard substrate 11 is -300V, and the plasma cleaning time is 9 minutes;

[0059] Sputtering of the transition layer 13: 100 sccm of argon gas is introduced, the bias voltage applied to the hard substrate 11 is -50V, the chromium target 22 is turned on, the power is set to 8kw, and the deposition time is 10min.

[0060] Sputtering chromium nitride layer 151: the flow rate of argon gas is 100 sccm, the flow rate of nitrogen gas is 10 sccm, the chromium target 22 is turned on, its power is set to 1kw, the bias voltage applied to the hard substrate 11 is -100V, and the deposition takes 20 minutes;

[0061] Sputtering the hafnium nitride layer 153: the flow rate of argon gas is 100 sccm, the flow rate of nitrogen gas is 10 sccm, the hafnium target 23 is turned on, a bias voltage of -100V is applied to the hard substrate 11, and the deposition is performed for 60 minutes.

[0062] Molybdenum nitride laye...

Embodiment 2

[0065] Plasma cleaning: the argon flow rate is 280 sccm, the bias voltage of the hard substrate 11 is -300V, and the plasma cleaning time is 9 minutes;

[0066] Sputtering transition layer 13: 100 sccm of argon gas is introduced, the bias voltage of -100V is applied to the hard substrate 11, the chromium target 22 is turned on, the power is set to 10kw, and the deposition time is 20min.

[0067] Sputtering of chromium nitride layer 151: argon gas flow of 100 sccm, nitrogen gas flow rate of 40 sccm, chromium target 22 was turned on, its power was set to 2kw, the bias voltage of hard substrate 11 was set to -150V, and deposition was carried out for 25 minutes;

[0068] Sputtering the hafnium nitride layer 153: Argon gas flow rate is 100 sccm, nitrogen gas is set to 40 sccm, the hafnium target 23 is turned on, a bias voltage of -200V is applied to the hard substrate 11, and the deposition is carried out for 70 minutes.

[0069] Molybdenum nitride layer 155 was sputtered: Argon ga...

Embodiment 3

[0072] Plasma cleaning: the argon flow rate is 280 sccm, the bias voltage of the hard substrate 11 is -300V, and the plasma cleaning time is 9 minutes;

[0073] Sputtering the transition layer 13: Argon gas flow rate is 100 sccm, the bias voltage applied on the hard substrate 11 is -100V, the chromium target 22 is turned on, the power is set to 13kw, and the deposition time is 30min.

[0074] Sputtering the chromium nitride layer 151: the flow rate of argon gas is 100 sccm, the flow rate of nitrogen gas is 70 sccm, the chromium target 22 is turned on, its power is set to 3kw, the bias voltage of the hard substrate 11 is set to -300V, and the deposition is carried out for 30 minutes;

[0075] Sputtering the hafnium nitride layer 153: the argon gas flow rate is 100 sccm, the nitrogen gas flow rate is 70 sccm, the hafnium target 23 is turned on, a bias voltage of -300V is applied to the hard substrate 11, and the deposition takes 90 minutes.

[0076] Molybdenum nitride layer 155 ...

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Abstract

The invention provides a covering member, comprising a hard matrix on which a transition layer, a composite hard layer and an antioxidation layer are formed in sequence. The transition layer is a chromium layer. The composite hard layer consists of a chromium nitride layer, a hafnium nitride layer and a molybdenum nitride layer. The antioxidation layer is an aluminum oxide layer. In addition, the invention also provides a manufacture method for the covering member. The method comprises the following steps of: providing the hard matrix; and forming the transition layer, the composite hard layer and the antioxidation layer in sequence on the hard matrix through magnetron sputtering. The covering member manufactured by the method has high hardness as well as a relatively good antioxidation performance.

Description

technical field [0001] The present invention relates to a covering and a manufacturing method thereof. Background technique [0002] The vacuum coating process is widely used in the industrial field. Among them, TiN thin film coating on the surface of the tool or mold can greatly improve the service life of the tool and mold. However, with the development of metal cutting towards high cutting speed, high feed speed, high reliability, long life, high precision and good cutting control, higher requirements are put forward for the performance of surface coating parts. The traditional single TiN coating can no longer meet the requirements in terms of hardness and toughness. [0003] ZrN thin films have attracted widespread attention because their hardness and toughness are superior to those of TiN thin films. However, a single ZrN film has little room for improvement in terms of hardness and oxidation resistance, and it is difficult to meet the needs of modern industry. It is...

Claims

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Application Information

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IPC IPC(8): C23C14/35C23C14/16C23C14/06B32B9/04B32B15/00
Inventor 张新倍陈文荣蒋焕梧陈正士杜艳娜
Owner HONG FU JIN PRECISION IND (SHENZHEN) CO LTD
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