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Diplopore-structured arsenic adsorption material and preparation method thereof

A technology of adsorption material and pore structure, applied in chemical instruments and methods, adsorption water/sewage treatment, other chemical processes, etc., can solve problems such as unsuitability for various water processors, small arsenic exchange capacity, interference of arsenic adsorption, etc. Achieve the effects of avoiding the loss of effective components, fast adsorption, and reducing mass transfer resistance

Inactive Publication Date: 2012-10-31
INST OF METAL RESEARCH - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The disadvantage of ion exchange arsenic removal technology is that the common anions in the source water will interfere with the adsorption of arsenic, especially the competitive adsorption of sulfate ions, so the exchange capacity for arsenic is small
The disadvantage of this technology is that before reverse osmosis or nanofiltration, it is necessary to consider and implement the pretreatment of the source water according to the water quality of the source water to prevent the membrane from being polluted during the reverse osmosis process.
However, in the existing adsorption technology, for example, the traditional nano-arsenic adsorption material is used. It is difficult to make the adsorption material into larger particles, which is not suitable for use in various water processors, and it is prone to problems such as difficulty in separating the nano-material from the treated water.

Method used

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  • Diplopore-structured arsenic adsorption material and preparation method thereof
  • Diplopore-structured arsenic adsorption material and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0036] Preparation of silica support

[0037] First, tetraethyl orthosilicate, water, nitric acid, and polyethylene glycol are mixed and stirred at a mass ratio of 12.26:17.2:1.38:1, hydrolyzed at room temperature, and then placed at 40 degrees Celsius for gel-phase The reaction was separated to obtain a silica framework with a macropore diameter of 10 μm, moderate strength, and able to withstand a certain pressure, in which the mass fraction of nitric acid was 36%.

[0038] Preparation of mesoporous

[0039]Immerse the obtained silica skeleton with a macropore diameter of 10 μm in 0.5 mol / L ammonia water and treat it at 120 degrees Celsius for 9 hours, take it out, dry it, and calcinate to obtain a silica carrier with a double-pore structure, with a macropore diameter of 10 μm and a mesopore diameter of 10 μm. 23nm, the specific surface area is 193m 2 / g.

[0040] The obtained macropore diameter is 10 μm, and the silica carrier with a dual-pore structure with a mesopore di...

Embodiment 2

[0043] Preparation of silica support

[0044] The difference from Example 1 is that tetraethyl orthosilicate, water, nitric acid, and polyethylene glycol are mixed and stirred at a ratio of 12.26:17.2:1.38:1, hydrolyzed at room temperature, and placed under the condition of 41 degrees Celsius after hydrolysis is complete. The gel-phase separation reaction is carried out to obtain a silica framework with a macropore diameter of 7 μm, which has moderate strength and can withstand a certain pressure.

[0045] Preparation of mesoporous

[0046] The obtained silica skeleton with a macropore diameter of 7 μm was immersed in 0.2 mol / L ammonia water at 120 degrees Celsius for 9 hours, and then dried and calcined to obtain a dual-porous silica carrier with a macropore diameter of 7 μm and a mesopore diameter of 13nm, the specific surface area is 412m 2 / g.

[0047] Immerse the silica carrier with a dual-pore structure in a cerium nitrate solution with a concentration of 500g / L, soak...

Embodiment 3

[0049] Preparation of silica support

[0050] The difference from Example 1 is that tetraethyl orthosilicate, water, nitric acid, and polyethylene glycol are mixed and stirred at a ratio of 12.26:17.2:1.38:1, hydrolyzed at room temperature, and placed under the condition of 42 degrees Celsius after hydrolysis is complete. The gel-phase separation reaction is carried out to obtain a silica framework with a macropore diameter of 1.8 μm, which has moderate strength and can withstand a certain pressure.

[0051] Preparation of mesoporous

[0052] The obtained silica skeleton with a macropore diameter of 1.8 μm was immersed in 0.2mol ammonia water at 80°C for 9 hours, then dried and calcined to obtain a silica carrier with a dual-pore structure, with a macropore diameter of 1.8 μm and a mesopore diameter of 15nm, the specific surface area is 320m 2 / g.

[0053] Immerse the silica carrier with a dual-pore structure in a cerium nitrate solution with a concentration of 2000g / L, soa...

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Abstract

The invention relates to the field of adsorption material preparation, and relates to a diplopore-structured arsenic adsorption material used for absorbing arsenic in water, and a preparation method thereof. According to the diplopore-structured arsenic adsorption material, a diplopore structure is composed of silicon dioxide and cerium oxide binary components. Silicon dioxide provides a carrier, and cerium oxide provides absorption activity. The material has macropores providing channels of flowing liquids, and mesopores uniformly loading cerium oxide crystal grains. According to the invention, a sol-gel-phase separation method is adopted for preparing a silicon dioxide framework; the silicon dioxide framework is treated by using ammonia water, such that a silicon dioxide carrier with a diplopore structure is formed; the cerium-oxide-loaded arsenic adsorption material is prepared by using an impregnation method, wherein the diplopore-structured silicon dioxide carrier is impregnated by using a cerium nitrate solution, and the silicon dioxide carrier is dried and calcined, such that the diplopore-structured arsenic adsorption material is finally obtained. With the diplopore-structured arsenic adsorption material, arsenic in water can be rapidly absorbed. During an arsenic removing process, mass transfer resistance can be effectively reduced. The material can be repeatedly used.

Description

technical field [0001] The invention relates to the field of preparation of adsorption materials, in particular to a double-hole structure arsenic adsorption material for adsorbing arsenic in water and a preparation method thereof. Background technique [0002] The dangers of arsenic [0003] A member of the nitrogen family, arsenic is an odorless and tasteless semimetal that occurs naturally in rocks and soil. It can synthesize organic and inorganic arsenic with other elements, the latter being more toxic and more common in water. According to the WHO, long-term drinking of water containing more than 10 milligrams of arsenic per liter can lead to arsenic poisoning, a chronic disease that leads to skin disorders, gangrene and cancers of the kidney and bladder. [0004] The toxicity of elemental arsenic is very low, but the compounds of arsenic are all poisonous, arsenic (As 2 o 3 ) is a three-intermediate arsenic compound. After arsenic enters the human body and is absor...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J20/10B01J20/32C02F1/28C02F1/58
Inventor 孙武珠李琦高世安尚建库
Owner INST OF METAL RESEARCH - CHINESE ACAD OF SCI
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