Manufacture method of multilayer gradient nano-composite diamond film of surface of die steel
A diamond thin film and nanocomposite technology, applied in coating, metal material coating process, ion implantation plating, etc., can solve the problems of high wear, low bonding force between mold steel and protective coating, etc., to overcome high internal stress , Excellent high temperature anti-wear and self-lubricating performance, realize the effect of mass production
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Embodiment 1
[0017] Take a 2cm×2cm steel sheet and follow the steps below:
[0018] (1) Die steel is ultrasonically cleaned successively in acetone and dichloromethane solution;
[0019] (2) Place the mold steel in the vacuum system of the magnetron sputtering composite vapor deposition system, and perform argon plasma sputtering cleaning. 30min;
[0020] (3) Ti bonding layer is plated by magnetron sputtering, the metal Ti target is the cathode, the working gas is argon, and the processing time is 10-15 minutes.
[0021] (4) TiN layer is deposited by sputtering, the metal Ti target (is the cathode, the working gas is argon and nitrogen, the bias voltage is 600-800V, the duty cycle is 70-90%, the current of the metal Ti target is controlled at 12-20A, The deposition time is 30-40 minutes;
[0022] (5) Deposit the BN layer by magnetron sputtering, control the power of the radio frequency B target to 3000-5000W, the bias voltage to -600V, the duty cycle to 80-90%, and the processing time t...
Embodiment 2
[0025] Take a 2cm×2cm steel sheet and follow the steps below:
[0026] (1) Die steel is carried out degreasing and cleaning, then in acetone and dichloromethane solution, carry out ultrasonic cleaning successively;
[0027] (2) Place the mold steel in the vacuum system of the magnetron sputtering composite vapor deposition system, and perform argon plasma sputtering cleaning. 30min;
[0028] (3) The Cr bonding layer is deposited by sputtering, the metal Cr is used as the cathode, the working gas is argon, and the processing time is 10-15 minutes.
[0029] (4) CrN layer is deposited by sputtering, the metal Cr target is the cathode, the working gas is argon and nitrogen, the bias voltage is 600-800V, the duty cycle is 70-90%, and the current of the metal Cr target is controlled at 12-20A. The time is 30-40 minutes;
[0030] (5) Deposit the BN layer by magnetron sputtering, control the power of the radio frequency B target to 3000-5000W, the bias voltage to -600V, the duty cy...
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