Metal-halide-doped organic hole transporting layer, and preparation method and application thereof
A metal halide, hole transport layer technology, applied in photosensitive equipment, semiconductor/solid-state device manufacturing, electric solid-state devices, etc., can solve the problems of insufficient long-term stability, low solubility, high cost, etc., and achieve good application prospects, Simple preparation method, wide application effect
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Embodiment 1
[0022] Dissolve a certain amount (such as 90mg) of spiro-OMeTAD in chlorobenzene (such as 0.5mL) to obtain an organic hole transport material solution (solution A), and a certain amount of tin tetrachloride (such as 10g) is dissolved in an acetonitrile solution (such as 1mL) A metal halide dopant solution (solution B) was obtained from the solution (solution B), and a certain amount of solution B was added to A, and ultrasonically mixed to make it fully mixed, and finally the mixed solution was spin-coated on the substrate, and heated and dried at a certain temperature, that is A hole transport layer is obtained.
[0023] A solid-state dye-sensitized solar cell was assembled using the hole-transporting layer, with an intensity of 100mWcm -2 The photoelectric performance test of the simulated solar light source shows that the short-circuit current density of the solar cell J sc =7.52mA / cm 2 , open circuit voltage V oc =876mV, fill factor FF=0.47, photoelectric conversion eff...
Embodiment 2
[0026] Dissolve a certain amount (such as 90mg) of spiro-OMeTAD in chlorobenzene (such as 0.5mL) to obtain an organic hole transport material solution (solution A), and a certain amount of tin tetrachloride (such as 10g) is dissolved in an acetonitrile solution (such as 1mL) To obtain a metal halide dopant solution (solution B), take a certain amount of solution B and add it to A, and mix it thoroughly with ultrasound to obtain a hole transport material solution. Finally, the mixed solution is spin-coated on the substrate, and in a certain heating and drying at a lower temperature to obtain a hole transport layer.
[0027] A solid-state dye-sensitized solar cell was assembled using the hole-transporting layer, with an intensity of 100mWcm -2 The photoelectric performance test of the simulated solar light source shows that the short-circuit current density of the solar cell J sc =7.05mA / cm 2 , open circuit voltage V oc =858mV, fill factor FF=0.50, photoelectric conversion ef...
Embodiment 3
[0030] A certain amount (such as 30mg) of P3HT was dissolved in chlorobenzene (such as 1mL) to obtain an organic hole transport material solution (solution A), and a certain amount of tin tetrachloride (such as 10g) was dissolved in an acetonitrile solution (such as 1mL) to obtain a metal Halide dopant solution (solution B), take a certain amount of solution B and add it to A, ultrasonically mix it thoroughly to obtain a hole transport material solution, and finally spin-coat the mixed solution on the substrate and heat it at a certain temperature drying to obtain the hole transport layer.
[0031] A solid-state dye-sensitized solar cell was assembled using the hole-transporting layer, with an intensity of 100mWcm -2 The photoelectric performance test of the simulated solar light source shows that the short-circuit current density of the solar cell J sc =3.46mA / cm 2 , open circuit voltage V oc =730mV, fill factor FF=0.63, photoelectric conversion efficiency η=1.59%.
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