Method for preparing copper indium gallium selenide thin film with sulfur-rich surface
A copper indium gallium selenide and thin film technology, which is applied in the field of photovoltaic new energy materials, can solve the problems of difficult control of product stoichiometric ratio, poor thin film compactness and adhesion, and narrow thin film energy band width, etc. Low, improve the effect of absorption and utilization
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
preparation example Construction
[0013] The embodiment of the present invention provides a method for preparing a sulfur-rich copper indium gallium selenium film on the surface, which includes the following steps:
[0014] S01. Preparation of copper indium gallium selenium nanoparticles: mixing copper salt, indium salt, gallium salt and selenium source compound with oleylamine to synthesize copper indium gallium selenium nanoparticles;
[0015] S02. Preparation of copper indium gallium selenide nanocrystalline ink: dispersing the copper indium gallium selenide nano particles in an organic solvent to form a copper indium gallium selenide nanocrystalline ink;
[0016] S03. Preparation of a copper indium gallium selenide film: coating the copper indium gallium selenide nano ink on a substrate to form a copper indium gallium selenide precursor prefabricated film, and obtaining a copper indium gallium selenide film after annealing;
[0017] S04. Copper indium gallium selenide thin film vulcanization treatment: in the prese...
Embodiment 1
[0034] (1) At room temperature, add 1.0mmol copper nitrate, 0.8mmol indium nitrate, 0.2mmol gallium nitrate and 2.0mmol selenium powder to a 50mL three-necked flask, then add 20mL oleylamine, and connect the device. Then, the reaction liquid was circulated and purged twice by means of vacuum and nitrogen atmosphere circulation, each time was purged for 15 minutes. Finally, the reaction vessel was filled with nitrogen. Under magnetic stirring, heat the reaction device. When it rises to 265°C, keep the temperature constant and react for 40 minutes. Then, the reaction solution is cooled to room temperature, and the reaction solution is filtered to obtain a solid product, which is washed 5 times with a mixture of one or more of ethanol, isopropanol, hexane or chloroform to obtain a clean solid product.
[0035] (2) Then put the product in toluene to form a stable colloidal solution with a concentration of 30 mg / mL-copper indium gallium selenide nanocrystalline ink.
[0036] (3) Cut t...
Embodiment 2
[0039] (1) At room temperature, add 1.0mmol copper chloride, 0.8mmol indium nitrate, 0.3mmol gallium nitrate and 2.0mmol selenium powder into a 50mL three-necked flask, then add 20mL oleylamine, and connect the device. Then, the reaction liquid was circulated and purged twice by means of vacuum and nitrogen atmosphere circulation, each time was purged for 15 minutes. Finally, the reaction vessel was filled with nitrogen. Under magnetic stirring, heat the reaction device. When it rises to 280°C, keep the temperature constant, react for 40 minutes, and then cool the reaction solution to room temperature. The reaction liquid is filtered to obtain a solid product, and the mixture is washed 5 times with one or more of ethanol, isopropanol, hexane or chloroform to obtain a clean solid product.
[0040] (2) Then put the product in toluene to form a stable colloidal solution with a concentration of 50 mg / mL-copper indium gallium selenide nanocrystalline ink.
PUM
Property | Measurement | Unit |
---|---|---|
concentration | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
concentration | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com