Silicon carbide schottky junction type nuclear battery comprising niobium doped n-type epitaxial layer

A silicon carbide and nuclear battery technology, applied in the field of silicon carbide Schottky junction nuclear batteries, can solve the problems of large energy loss of incident particles, low energy conversion efficiency, etc., to increase the width of the depletion region, improve the collection rate, The effect of improving open circuit voltage and energy conversion efficiency

Inactive Publication Date: 2014-03-19
溧阳市浙大产学研服务中心有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The Schottky contact layer of the Schottky nodule battery covers the entire battery area. After the incident particles reach the surface of the device, they will be blocked by the Schottky contact layer. Only some particles can enter the interior of t

Method used

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  • Silicon carbide schottky junction type nuclear battery comprising niobium doped n-type epitaxial layer

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] Step 1, epitaxial n-type epitaxial layer on SiC highly doped n-type substrate sample.

[0025] The selected doping concentration is 1×10 18 cm -3 The highly doped n-type SiC substrate 7, after cleaning, is epitaxially grown on the highly doped n-type SiC substrate with a thickness of 4um and an initial n-type epitaxial layer doped with nitrogen ions, and its doping concentration is 1×10 15 cm -3 , the epitaxy temperature is 1570°C, the pressure is 100mbar, the reaction gases are silane and propane, the flow rates are 50sccm and 150sccm respectively, the carrier gas is pure hydrogen, and the impurity source is liquid nitrogen.

[0026] Step 2: For a nitrogen doping concentration of 1 x 10 15 cm -3 The initial n-type SiC epitaxial layer is implanted with niobium ions.

[0027] (2.1) The concentration of nitrogen doping is 1×10 15 cm -3 The initial n-type SiC epitaxial layer was implanted with niobium ions, and the conditions of the niobium ion implantation were: th...

Embodiment 2

[0043] Step 1: Epitaxial n-type epitaxial layer on SiC highly doped n-type substrate sample.

[0044] The selected doping concentration is 5×10 18 cm -3 The highly doped n-type SiC substrate 7, after cleaning, is epitaxially grown on the highly doped n-type SiC substrate with a thickness of 3um and an initial n-type epitaxial layer doped with nitrogen ions, and its doping concentration is 5×10 15 cm -3 , the epitaxy temperature is 1570°C, the pressure is 100mbar, the reaction gases are silane and propane, the flow rates are 50sccm and 150sccm respectively, the carrier gas is pure hydrogen, and the impurity source is liquid nitrogen.

[0045] Step 2: The concentration of nitrogen doping is 5×10 15 cm -3 The initial n-type SiC epitaxial layer is implanted with niobium ions.

[0046] (2.1) The concentration of nitrogen doping is 5×10 15 cm -3 The initial n-type SiC epitaxial layer was implanted with niobium ions, and the conditions of the niobium ion implantation were: the...

Embodiment 3

[0062] Step A: Epitaxial n-type epitaxial layer on SiC highly doped n-type substrate sample.

[0063] The selected doping concentration is 7×10 18 cm -3 The highly doped n-type SiC substrate 7, after cleaning, is epitaxially grown on the highly doped n-type SiC substrate with a thickness of 5um and an initial n-type epitaxial layer doped with nitrogen ions, and its doping concentration is 2×10 15 cm -3 , the epitaxy temperature is 1570°C, the pressure is 100mbar, the reaction gases are silane and propane, the flow rates are 50sccm and 150sccm respectively, the carrier gas is pure hydrogen, and the impurity source is liquid nitrogen.

[0064] Step B: For a nitrogen doping concentration of 2 x 10 15 cm -3 The initial n-type SiC epitaxial layer is implanted with niobium ions.

[0065] (B1) The concentration of nitrogen doping is 2×10 15 cm -3 The initial n-type SiC epitaxial layer was implanted with niobium ions, and the conditions of the niobium ion implantation were: the...

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Abstract

The invention discloses a silicon carbide schottky junction type nuclear battery comprising a niobium doped n-type epitaxial layer. The silicon carbide schottky junction type nuclear battery comprises an n-type Ohmic contact electrode 8, an n-type SiC substrate 7, an n-type SiC epitaxial layer 6, a SiO2 passivation layer 5, a schottky metal contact layer 4, a schottky contact electrode 3, a bonding layer 2 and a radioactive isotope source layer 1 successively from bottom to top, wherein the n-type SiC epitaxial layer 6 is formed by injecting niobium ions having energy which is in the range from 2000KeV to 2500KeV and having a dosage which is in the range from 5*10<13> cm<-2> to 1*10<15> cm<-2>, wherein the doping concentration of the n-type SiC epitaxial layer 6 is in the range from 1*10<13> cm<-3> to 5*10<14> cm<-3>. According to the invention, the carrier concentration of the epitaxial layer is low and the depletion region width is wide, so the collection efficiency of generated electron hole pairs can be improved, so that the device open-circuit voltage and energy conversion efficiency can be improved.

Description

technical field [0001] The invention belongs to the cross technical field of nuclear technology and microelectronics, and in particular relates to a silicon carbide Schottky junction nuclear battery, which can directly convert nuclear energy emitted by isotopes into electric energy. technical background [0002] In 1953, it was discovered that β particles produced by isotope decay can generate electron-hole pairs in semiconductors, and this phenomenon is called β voltage effect. In 1957, people first applied the β voltage effect to the power supply, and successfully manufactured the first isotope micro-battery. Since 1989, GaN, GaP, AlGaAs, polysilicon and other materials have been used as materials for β-Voltaic batteries. With the preparation of the wide bandgap semiconductor material SiC and the advancement of process technology, since 2006, there have been reports on SiC-based isotope micro-batteries at home and abroad. [0003] Chinese patent document CN101325093A dis...

Claims

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Application Information

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IPC IPC(8): G21H1/06
Inventor 梅欣
Owner 溧阳市浙大产学研服务中心有限公司
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