Ultrafiltration system

An ultrafiltration system and precision filter technology, applied in the field of ultrafiltration systems, can solve problems such as difficulties and complicated ultrapure water preparation processes, and achieve the effects of increased desalination rate, high recovery rate, and strong pollution interception ability

Inactive Publication Date: 2014-03-26
南京海联净化设备有限公司
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  • Abstract
  • Description
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Problems solved by technology

The preparation process of ultrapure water is very complicated and difficult, and the general process is difficult to reach the standard of ultrapure water. Therefore, how to improve the deficiencies of the existing technology and use membrane technology to provide a new ultrapure water device in the production process It is still a problem to be solved urgently by those skilled in the art

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Embodiment Construction

[0014] The present invention will be described in further detail below in conjunction with the accompanying drawings and specific embodiments.

[0015] The traditional ultrapure water preparation process is as follows: raw water passes through a multi-media filter, enters an activated carbon filter, and then desalinizes through an ion exchanger, and finally passes through a mixed ion exchange column to generate ultrapure water.

[0016] like figure 1 As shown, the ultrafiltration system of the present invention includes a raw water tank and a pretreatment system connected by a high-pressure pump. The pretreatment system is connected to a desalination system through a high-pressure pump. The desalination system is connected to an ozone sterilizer, an ozone sterilizer, and a fine treatment system, and the ultrapure water tank is connected in sequence; the pretreatment system includes a multi-media filter, an activated carbon filter, a precision filter and a hollow fiber ultrafil...

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Abstract

The invention discloses an ultrafiltration system, which comprises an original water box and a pre-treatment system, wherein the parts of the pre-treatment system are connected through high-pressure pumps; the pre-treatment system is connected with a desalination system via a high-pressure pump; the desalination system is sequentially connected with an ozone sterilizer, a fine treatment system and an ultrapure water box; the pre-treatment system comprises a multi-medium filter, an acticarbon filter, a precise filter and a hollow fiber ultrafiltration system which are connected in sequence; the desalination system adopts a reverse osmosis device; the fine treatment system adopts EDI (Electronic Data Interchange) equipment. The ultrafiltration system disclosed by the invention has the advantages that the reverse osmosis device is adopted to replace a traditional used ion exchanger, and the desalination rate and recovery rate are high; in addition, not only is desalination realized, but also most bacteria, colloid and organic substances with large molecular weight are removed; the EDI equipment replaces a mixed ion exchange column, the chemical regeneration of acid and alkali is not required during running, so that a large amount of acid, alkali and water for cleaning are saved, the labor density is greatly lowered, and more importantly, the no waste acid or waste lye is discharged, so that the environmental protection is facilitated.

Description

technical field [0001] The invention relates to an ultrafiltration system, which belongs to the technical field of purification. Background technique [0002] The ultrafiltration device is a device that uses ultrafiltration technology to purify water to obtain ultrapure water. Ultrapure water refers to almost completely removing the dielectric medium in water, and simultaneously removing non-dissociated gases, colloidal substances, and organic substances (including Bacteria, etc.) are also removed to a very low level of water, the resistivity is generally 18MΩ·cm (25°C), and the salt content is <0.1mg / L. Ultrapure water is generally used in the integrated circuit industry for cleaning semiconductor raw materials and used utensils, preparation of photolithography masks, and water vapor sources for silicon wafer oxidation. In addition, other solid-state electronic devices, thick and thin film circuits, printed circuits, vacuum tubes, etc. also use ultrapure water. The pre...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C02F9/06
CPCY02A20/131
Inventor 陈优国
Owner 南京海联净化设备有限公司
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