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High ferulic acid stress resistance clostridium beijerinckii and application thereof

A technology of Clostridium beijerinckii and ferulic acid, which is applied in the direction of bacteria, microorganisms, biochemical equipment and methods, can solve the problems of production stoppage of bio-butanol manufacturers, and achieve high butanol production, strong stress resistance, and repeated good sex effect

Active Publication Date: 2015-07-01
NANJING TECH UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Since 2008, my country has established many bio-butanol production lines with an annual production capacity of 100,000 tons; however, due to the continuous increase of starchy and molasses raw materials, most bio-butanol manufacturers are in a state of suspension

Method used

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  • High ferulic acid stress resistance clostridium beijerinckii and application thereof
  • High ferulic acid stress resistance clostridium beijerinckii and application thereof
  • High ferulic acid stress resistance clostridium beijerinckii and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] This example illustrates the first step of plasma mutagenesis of the original strain of Clostridium beijingii.

[0032] The method for the first step plasma mutagenesis of the original strain of Clostridium beijerinckii is as follows:

[0033] Activate the original strain of Clostridium beijerinckii NCIMB8052 at a culture temperature of 33~37℃, a 50ml Schott anaerobic bottle with a volume of 15~20ml, nitrogen gas for 3min, and a culture time of 12~18h to obtain a vigorous bacterial solution; take fresh Cultured cells are diluted to cell concentration OD 600 =1~1.5, drip on the sterilized and cooled slide, dry with sterile air; use helium as the discharge gas, 100W as the radio frequency power, 10SLM as the gas flow, and 10~1800s as the irradiation time Plasma mutagenesis was performed on the strain, and after the mutagenesis, the bacterial membrane on the carrier was eluted and the survival rate was calculated. The experimental results are attached figure 1 Shown by figure...

Embodiment 2

[0035] This example illustrates the method of screening excellent Clostridium beijerinckii.

[0036] Among them, the medium formula used (% is the mass percentage):

[0037] (1) Solid plate medium: yeast powder 0.3%, peptone 0.5%, soluble starch 1%, ammonium acetate 0.2%, sodium chloride 0.2%, magnesium sulfate heptahydrate 0.3%, potassium dihydrogen phosphate 0.1%, dihydrogen phosphate Potassium 0.1%, ferrous sulfate heptahydrate 0.01%, agar 1.5%, pH 6.

[0038] (2) Resazurin plate medium: yeast powder 0.3%, peptone 0.5%, soluble starch 1%, ammonium acetate 0.2%, sodium chloride 0.2%, magnesium sulfate heptahydrate 0.3%, potassium dihydrogen phosphate 0.1%, phosphoric acid Dipotassium hydrogen 0.1%, ferrous sulfate heptahydrate 0.01%, agar 1.5%, resazurin 0.002%, ferulic acid 0.5%, pH 6.

[0039] (3) Seed culture medium: yeast powder 0.3%, peptone 0.5%, soluble starch 1%, ammonium acetate 0.2%, sodium chloride 0.2%, magnesium sulfate heptahydrate 0.3%, potassium dihydrogen phosphate...

Embodiment 3

[0050] This example illustrates the passage stability of the mutant M11.

[0051] In the fermentation medium using glucose as the carbon source, the passage stability of the mutant strain M11 was tested. The results of the passage fermentation test of the strain M11 are shown in Table 2:

[0052] Table 2

[0053]

[0054] From the experimental results, it can be seen that after 7 consecutive passages, the total solvent yield and butanol yield of the two mutant strains are relatively stable, with good passage stability, and can be used as production strains for further research and development.

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Abstract

The invention discloses high ferulic acid stress resistance clostridium beijerinckii and an application thereof. The high ferulic acid stress resistance clostridium beijerinckii is classified and named Clostridium beijerinckii M11 with the collection number of CCTCC No:M2013423, and the collection date of the high ferulic acid stress resistance clostridium beijerinckii is December 14, 2013. A mutant strain obtained by adopting plasmas for mutating the clostridium beijerinckii and a ferulic acid containing resazurin flat plate and a shake flask for fermentation and screening can normally grow in a fermentation medium containing 0.8g / L of ferulic acid, the yield of butanol reaches 6.1g / L, and an original strain cultured under equal conditions hardly grows. Moreover, by using virus-carrying corncob acidolysis sugar liquid as a carbon source, the yield of butanol in a 2L fermentation tank reaches 6.4g / L, and the original strain cultured under equal conditions hardly grows. The high ferulic acid stress resistance clostridium beijerinckii has strong stress resistance, high butanol yield and good repeatability, and is an excellent strain suitable for the fermentation production of butanol by using wood fiber raw materials such as corncobs and the like.

Description

Technical field [0001] The invention relates to a strain of Clostridium beijerinckii with high stress resistance to ferulic acid and its application in the acetone butanol fermentation industry, belonging to the technical field of biological fermentation. Background technique [0002] As a new type of renewable liquid energy, butanol is valued by more and more countries in the world; butanol has the advantages of high energy density, can be mixed with gasoline at any ratio, can be directly used in internal combustion engines, and convenient transportation. At present, the production method of butanol is mainly synthesized by chemical method. With the increasingly severe energy crisis, the accelerated depletion of petroleum resources and the soaring price, the production of butanol by biological method, as an effective use of biomass resources to produce important platform compounds and fuels The biotransformation technology of China has begun to be valued again. Since 2008, my c...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C12N1/20C12P7/16C12R1/01
Inventor 应汉杰华莹郭亭刘俊王冬谢婧婧陈勇吴菁岚陈晓春朱晨杰庄伟
Owner NANJING TECH UNIV