Photosensitive acrylic AED resin and negative photoresist composition comprising same, and preparation method thereof

A technology of photosensitive acrylic and photoresist, applied in the field of photosensitive acrylic AED resin, negative photoresist composition, the preparation of the composition, can solve the problem of poor adhesion, uneven film thickness, The problem of low degree of automation

Inactive Publication Date: 2014-05-28
JIANGYIN MORE CHEM NEW MATERIALS
View PDF6 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The traditional dry film method is commonly used in commercial photoresists. The photoresist prepared by the dry film method has a film layer and a copper surface that are bonded together by physical force. Often the

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Photosensitive acrylic AED resin and negative photoresist composition comprising same, and preparation method thereof
  • Photosensitive acrylic AED resin and negative photoresist composition comprising same, and preparation method thereof
  • Photosensitive acrylic AED resin and negative photoresist composition comprising same, and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0085] Example 1: Negative photoresist composition

[0086] Add 50g of ethylene glycol butyl ether (BCS) into a 250ml four-necked flask, stir and add dropwise a mixed solution containing 24g cyclohexyl vinyl ether, 40gEHA, 40gAA, 0.62gAIBN and 0.31gβ-ME at 85°C, and drop it within 3h Finish. After maintaining the reaction temperature for 1 h, 0.20 g AIBN dissolved in 5 g of butyl acetate was added, and the dripping was completed within 0.5 h. After maintaining the reaction temperature for 2.5 h, an acrylic copolymer was obtained.

[0087] Then the temperature of the copolymer was raised to 105°C, and a mixture of 15.8g GMA and 26.7g BCS in which 0.97g of triphenylphosphine (TPP), 1.20g of p-hydroxyanisole (MHEQ) and 26.7g of BCS were dissolved was added dropwise, and the dropping rate was controlled within 1 hour. The reactants other than the solvent account for about 60% of the total feed, and the solvent accounts for the remaining 40%. After dripping, the temperature is increase...

Example Embodiment

[0089] Example 2: Negative photoresist composition

[0090] Mix 10g of the photosensitive acrylic AED base material in Example 1 with 0.11g of photoinitiator ITX, 0.15g of photosensitizer 907, 1.2g of TMP(EO)3TA into a homogeneous phase, then add 1.53g of triethylamine dropwise, stir well and slowly drop Add 63g of deionized water to emulsify, continue to stir after dripping, add 0.15g of water-based color paste after aging for 24h, and obtain a negative photoresist after stirring evenly.

Example Embodiment

[0091] Example 3: Negative photoresist composition

[0092] The acrylic copolymer obtained in Example 1 was heated to 110°C, and a mixture of 31.6g GMA and 37.5g BCS in which 0.84g of triethylbenzylammonium chloride, 1.4g of p-hydroxyanisole (MHEQ) and 37.5g of BCS were dissolved was added dropwise. The dripping is completed within 1 hour, the reactants except the solvent account for about 60% of the total feed, and the solvent accounts for the remaining 40%. After dripping, the temperature is increased to 115°C, and the acid value is checked during the reaction, and the change does not exceed 2mgKOH / g in one hour , The reaction can be stopped and the photosensitive acrylic AED base material can be obtained.

[0093] Mix 10g photosensitive acrylic AED base material, 0.32g photoinitiator 1173, 0.6g TMP(EO)3TA into a homogeneous phase, then add 1.02g triethylamine dropwise, stir evenly, slowly drop 63g deionized water to emulsify, continue after dropping Stir, aging for 24 hours, ad...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a negative photoresist composition which is prepared by an anodic electrodeposition process. The photoresist composition mainly contains deionized water, (A) a photosensitive acrylic AED (Anodic Electrodeposition) base material, (B) a polyfunctional reactive diluent, (C) antalkali, (D) a photo-initiation body and (E) a water-based colour paste. A photoresist has high degree of automation through an AED method, and a film layer is thin and compact, has uniform thickness, and is tightly combined with the surface of an electrode. The photoresist can have enough and strong adhesive force on a filament during refining, the reliability during development and etching can be increased, and VOC emission is reduced to a great extent. The photoresist material can be applied to the fields of etching-resisting imaging printing ink, color filters of liquid crystal displays and the like.

Description

technical field [0001] The invention belongs to the technical field of ultraviolet curing coatings. The present invention mainly relates to photosensitive acrylic AED resin. The invention also relates to a negative photoresist composition prepared by anodic electrodeposition process, and the negative photoresist composition includes photosensitive acrylic AED resin. And the invention also relates to a preparation method of the composition. Background technique [0002] Negative photoresist is a kind of photosensitive polymer solution. The exposed part is photocrosslinked under irradiation, and the unexposed part can be dissolved and washed away by alkaline developer. The alkali-soluble photoresist has the advantages of good adhesion, complete coverage, accurate alignment, high dimensional accuracy, convenient development and film removal, and environmental protection. It has become a type of photoresist widely studied for the production of fine wires. resist. [0003] Th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C08F265/06C08F265/02C08F220/18C08F220/06C08F216/16C08F220/32G03F7/004G03F7/038G03F7/027
Inventor 何江川
Owner JIANGYIN MORE CHEM NEW MATERIALS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap