Method for growing ultraviolet LED epitaxy structure
A technology of LED epitaxial wafers and epitaxial structures, which is applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve the problems of low luminous efficiency and high voltage, and achieve the effects of easy heavy doping, lower contact voltage, and reduced absorption
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[0036] The invention adopts sapphire as a growth substrate to carry out heterogeneous epitaxial growth, and uses MOCVD (metal organic chemical vapor deposition) technology to complete the entire epitaxial process. Using trimethylgallium (TMGa), triethylgallium (TEGa), and trimethylindium (TMIn), trimethylaluminum (TMAl) and ammonia (NH3) silane (SiH4) and dimagnesocene (cp2mg) Provide gallium source, indium source, aluminum source, nitrogen source, silicon source and magnesium source required for growth respectively.
[0037] A layer of low-temperature AlN is grown on the sapphire substrate, and then a layer of AlN is grown at a high temperature, and then a few cycles of AlN / AlGaN superlattice structure layers are grown, and then a layer of n-type AlGaN doped with silane is grown, and then grown A layer of several periodic AlxGa1-xN / AlyGa1-yN (y>x) quantum well barrier regions, in which AlxGa1-xN is used as a well layer and AlyGa1-yN is used as a barrier layer. Then grow a ma...
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