Polymer for resist and resist composition containing same
A technology for resists and polymers, applied in the field of resist compositions and polymers for resists, can solve the problems of reduced etching resistance, pattern cracks, and deterioration of problems, and achieves prevention of reduced etching resistance, The effect of preventing thickness loss, excellent contrast
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Synthetic example 1
[0133] step 1
[0134]
[0135] In a 1L jacket type reactor, 360 g of 1,4-dioxane (1,4-dioxane) was used as a polymerization solvent, and 3-hydroxyadamantan-1-yl methacrylate (3-hydroxyadamantant - 1-yl methacrylate) (i) 120g and 6.5g of azobisisobutyronitrile (azobisbutyronitril, AIBN) as an initiator, then the temperature of the reactor was raised to 75°C and stirred for three hours. After cooling the obtained polymerization solution to normal temperature, n-hexane (n-hexane) was slowly added dropwise to carry out precipitation reaction. The obtained precipitate was filtered under reduced pressure with a vacuum filter, and dried under reduced pressure for one day to prepare 95 g of HAMA homopolymer (ii).
[0136] The polystyrene-equivalent weight average molecular weight (Mw) of the obtained polymer was 4955 g / mol, and the ratio (Mw / Mn) of the weight average molecular weight to the number average molecular weight was 1.64.
[0137] step 2
[0138]
[0139] In the ab...
Synthetic example 6
[0146] 20 g of the HAMA homopolymer (ii) prepared in the above step 1 of the above polymer synthesis example 1 was dissolved in 200 ml of tetrahydrofuran (THF), and then 3.05 g of tert-butyl vinyl ether and a catalyst amount of trifluoro Acetic acid (trifluoroacetic acid), stirred at room temperature for two days. After confirming the termination of the reaction by 1H NMR, the obtained polymerization solution was dropped into n-hexane (n-hexane) as a precipitation solvent to perform a precipitation reaction. The obtained precipitate was filtered under reduced pressure with a vacuum filter, and 15 g of polymer (1c) was prepared after one day of reduced-pressure drying.
[0147]
Synthetic example 7
[0149] 20 g of the HAMA homopolymer (ii) prepared in the above step 1 of the above polymer synthesis example 1 was dissolved in 200 ml of tetrahydrofuran (THF), and then 3.05 g of 3,4-dihydro-2H-pyran was added (3,4-Dihydro-2H-pyran) and a catalytic amount of trifluoroacetic acid (trifluoroacetic acid), stirred at room temperature for two days. After confirming the termination of the reaction by 1H NMR, the obtained polymerization solution was dropped into n-hexane (n-hexane) as a precipitation solvent to perform a precipitation reaction. The obtained precipitate was filtered under reduced pressure by using a vacuum filter, and 15.5 g of polymer (1d) was prepared by drying under reduced pressure for one day.
[0150]
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