Metal bipolar plate and preparation method thereof

A metal bipolar plate and modified layer technology, which is applied in battery electrodes, electrical components, circuits, etc., can solve the problems of large volume, low mechanical strength, limited application of graphite bipolar plates, etc., to improve long-term operation, overcome the Weak binding force, the effect of improving power generation performance

Active Publication Date: 2014-09-17
BEIJING INST OF SPACE LAUNCH TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] One of the key components of PEMFC, the bipolar plate, often uses graphite as the base material. However, the traditional graphite bipolar plate is large in size, low in mechanical strength, and high in cost. It is difficult to make breakthroughs in improving power density and shock resistance. Limit its application in power supply, etc.

Method used

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  • Metal bipolar plate and preparation method thereof
  • Metal bipolar plate and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0050] Pretreatment: L400 multi-arc ion plating equipment is used for film deposition. Firstly, the 0.1mm thick titanium substrate is treated with surface degreasing and depassivation layer in a mixture of hydrofluoric acid and hydrochloric acid, the treated titanium substrate is cleaned with deionized water, and then the titanium substrate is placed on on the substrate. There are four target positions in the coating chamber, Ti targets are installed on the two opposite cathode arc sources, and Cr targets are installed on the other pair of target positions. Wherein, the volume ratio of deionized water, concentrated hydrochloric acid and hydrofluoric acid in the mixed solution may be 10:4:1.

[0051] Sputtering cleaning: vacuumize the cavity until the vacuum degree is less than 10 -4 After Pa, Ar gas of 1.5 Pa was passed into the vacuum cavity, and the temperature of the titanium substrate was kept at 320°C. Before thin film deposition, the titanium substrate was cleaned by ...

Embodiment 2

[0062] The steps of pretreatment and sputtering cleaning are the same as in Example 1.

[0063] Deposition of titanium modified layer:

[0064] 1) Deposition of TiCN: Open the shielding plate of the Ti target, apply a bias voltage of -60V on the target, and keep the air pressure at 1.5Pa; 2 Gas, C 2 h 2 and Ar gas, N 2 and C 2 h 2 The flow ratio is 1:1.3, C 2 h 2 and N 2 The sum of the gas volume accounts for 70% of the total gas volume, and the reaction time is controlled to obtain a TiCN layer thickness of 0.8 μm;

[0065] 2) Deposition of TiC: Open the shielding plate of the Ti target, apply a bias voltage of -60V on the target, and keep the air pressure at 1.5Pa; 2 h 2 and Ar gas, so that the Ar gas carries a volume fraction of 70% of C 2 h 2 , control the reaction time, the obtained TiC layer thickness is 1.6 μm.

[0066] Deposition of chrome modified layer:

[0067] 1) Deposition of CrN: Open the shielding plate of the Cr target, apply a bias voltage of -60...

Embodiment 3

[0072] Pretreatment: L400 multi-arc ion plating equipment is used for film deposition. Firstly, the 0.1mm thick titanium substrate is treated with surface degreasing and depassivation layer in a mixture of hydrofluoric acid and hydrochloric acid, the treated titanium substrate is cleaned with deionized water, and then the titanium substrate is placed on on the substrate. There are four target positions in the coating chamber, Ti targets are installed on the two opposite cathode arc sources, and Cr targets are installed on the other pair of target positions. Wherein, the volume ratio of deionized water, concentrated hydrochloric acid and hydrofluoric acid in the mixed solution may be 9:5:1.

[0073] Sputtering cleaning: vacuumize the cavity until the vacuum degree is less than 10 -4 After Pa, Ar gas of 2.0 Pa was passed into the vacuum chamber, and the temperature of the titanium substrate was kept at 280°C. Before the thin film deposition, the titanium substrate was cleaned...

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Abstract

The invention discloses a metal bipolar plate. The metal bipolar plate comprises a titanium substrate and a surface modified layer, wherein the surface modified layer is formed by a titanium modified layer close to the titanium substrate and a chromium modified layer close to the titanium modified layer. The metal bipolar plate adopts the titanium modified layer as a transition layer and is mainly used for increasing the binding force of the chromium modified layer and the titanium substrate, and also achieving corrosion resistance, so that the adhesive force for a film layer is improved, and a high-hardness Cr compound film is prevented from cracking and dropping off; the chromium modified layer has effects of resisting corrosion and reducing contact resistance, so that the surface conductivity of the metal bipolar plate is improved and the service life of the metal bipolar plate is prolonged.

Description

technical field [0001] The invention relates to the technical field of fuel cell electrodes, in particular to a metal bipolar plate and a preparation method thereof. Background technique [0002] Proton exchange membrane fuel cell (PEMFC) has the advantages of environmental friendliness, high conversion efficiency, quick startup at room temperature, and low noise. The clean energy equipment used is widely favored. [0003] One of the key components of PEMFC, the bipolar plate, often uses graphite as the base material. However, the traditional graphite bipolar plate is large in size, low in mechanical strength, and high in cost. It is difficult to make breakthroughs in improving power density and shock resistance. It limits its application in aspects such as power supply. One of the solutions is to use a new type of metal bipolar plate. Metal materials have the advantages of high electrical conductivity, good gas barrier properties, easy processing and molding, high mechan...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01M4/86H01M4/88
CPCY02E60/50H01M4/8657H01M4/8817
Inventor 黄姝青宋艳平张宝春辛廷慧
Owner BEIJING INST OF SPACE LAUNCH TECH
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