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Method for measuring content of manganese in silicon-vanadium alloy

A technology of silicon vanadium alloy and manganese content, applied in the field of chemical detection, can solve the problems of high cost and long time, and achieve the effects of less reagents, convenient operation and low analysis cost

Active Publication Date: 2014-09-24
WUKUN STEEL
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Due to the low manganese content, the chemical analysis method can only be carried out by referring to the photometric method in other alloys, and a large amount of chemical reagents are used, which takes a long time and costs high

Method used

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  • Method for measuring content of manganese in silicon-vanadium alloy
  • Method for measuring content of manganese in silicon-vanadium alloy
  • Method for measuring content of manganese in silicon-vanadium alloy

Examples

Experimental program
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Effect test

preparation example Construction

[0018] 1) According to the preparation method of the sample solution in step A, prepare 6 blank sample solutions and transfer them into volumetric flasks;

[0019] 2) Precisely weigh 0.1000g of pure manganese with a purity greater than 99.9%, dissolve it with 30ml of 1+1 hydrochloric acid, transfer it into a 100ml volumetric flask, and dilute with distilled water or secondary deionized water to obtain a manganese standard stock solution;

[0020] 3) Add 0ml, 1.00ml, 3.00ml, 5.00ml, 7.00ml and 10.00ml of manganese standard stock solutions into the volumetric flasks of the aforementioned 6 blank sample solutions, add distilled water or secondary deionized water to constant volume to obtain Manganese standard solution;

[0021] C. Determination: Determination is performed by plasma atomic emission spectrometry.

[0022] The concentrated nitric acid concentration described in A step is 60~80%, preferably 70%.

[0023] The hydrofluoric acid concentration described in A step is 30...

Embodiment 1

[0046] Reagent used in the present invention and preparation thereof:

[0047] 1. Nitric acid (ρ1.42g / mL);

[0048] 2. Hydrofluoric acid (ρ1.15g / mL);

[0049] 3. Perchloric acid (ρ1.67g / mL);

[0050] 4. The above reagents nitric acid, hydrofluoric acid and perchloric acid are analytical reagents, and water is secondary deionized water.

Embodiment 2

[0052] 1. The preparation of the standard stock solution used in the working curve:

[0053] A. Weigh 0.1000g manganese metal (﹥99.9%) into a 100mL beaker, add 30mL hydrochloric acid (1+1), heat to dissolve completely, after cooling, transfer to a 1000mL volumetric flask, dilute to the mark with water, and mix well. 1 mL of this solution contains 100 μg manganese.

[0054] 2. Preparation of standard solution for working curve

[0055]2A. Add 8mL of concentrated nitric acid, 2.5mL of hydrofluoric acid, and 5mL of perchloric acid to six 100mL volumetric flasks, heat to emit perchloric acid fumes for 15 minutes, remove and cool, and add 10mL of distilled water.

[0056] 2B. Add 0mL, 1.00mL, 3.00mL, 5.00mL, 7.00mL, 10.00mL of the A standard stock solution in step 2 to the 6 solutions obtained in step A, add distilled water to a 100mL volumetric flask and shake well .

[0057] 2C, the working conditions of the instrument are shown in Table 1, the wavelength and series of element...

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Abstract

The invention discloses a method for measuring the content of manganese in silicon-vanadium alloy. The method comprises the following steps of pretreatment, standard solution preparation and measurement, and concretely comprises the steps of feeding concentrated nitric acid and hydrofluoric acid into a sample to be measured, then feeding perchloric acid until smoking and being nearly dry, taking down, making up to volume, and shaking up for measurement; making a manganese spectral line intensity-mass fraction work curve on a plasma atomic emission spectrometer by the prepared standard manganese solution, and analyzing the sample to be measured through the curve to obtain the content of the manganese in the silicon-vanadium alloy. According to the method, the content of the manganese in the silicon-vanadium alloy is measured by a plasma atomic emission spectrometry; the method is less in the used reagent and low in interference, and is capable of reducing the environmental pollution and increasing the working efficiency; the method is good in accuracy and e provides accurate data for production and utilization of the silicon-vanadium alloy in the iron and steel enterprises. The method is convenient and rapid to operate and low in analysis cost, and measurement results of the method are good in stability, reproducibility and accuracy, so that the daily demand of measuring the content of the impurity element in the silicon-vanadium alloy can be met.

Description

technical field [0001] The invention belongs to the technical field of chemical detection, and in particular relates to a method for measuring manganese content in silicon-vanadium alloys. Background technique [0002] Iron and steel enterprises produce a large amount of vanadium slag in the production process of ironmaking, steelmaking, and steel rolling. The vanadium and silica extracted from the vanadium slag are used as raw materials, coke is used as a reducing agent, and lime is used as a slagging agent to produce silicon vanadium. alloy. Adding silicon-vanadium alloys to steel can enhance the strength and toughness of steel bars, resist radiation embrittlement and radiation swelling, and make steel have good dimensional stability and processing performance under radiation. [0003] The main components of silicon vanadium alloy are vanadium, silicon, manganese, titanium, chromium and carbon. For manganese in silicon-vanadium alloys, there is no national standard or in...

Claims

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Application Information

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IPC IPC(8): G01N21/73G01N1/28
Inventor 陈涛陶俊赵绥
Owner WUKUN STEEL
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