The electrical conductive paste, solar cell and solar cell manufacturing method of solar cell electrodes of solar cells
A technology of solar cells and conductive paste, applied in the field of solar cells, to achieve the effect of improving electrical characteristics and reliability
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Deformed example 2
[0114] Figure 5 It is a schematic plan view of an example of another solar cell element 10 viewed from the back surface 9 b side. Figure 6 is a schematic representation Figure 5 A-A Cross-sectional view of the structure. Such as Figure 5 and Figure 6 As shown, the solar cell element 10 is characterized in that a passivation layer is formed on substantially the entire surface of both the front surface 9 a side and the rear surface 9 b side of the semiconductor substrate 1 . That is, the first passivation layer 11 is formed on the n-type semiconductor region 3 and the second passivation layer 12 is formed on the p-type semiconductor region 2 . The first passivation layer 11 and the second passivation layer 12 can be simultaneously formed over the entire periphery of the semiconductor substrate 1 by using, for example, an ALD (Atomic Layer Deposition) method. That is, the passivation layer made of the aforementioned aluminum oxide or the like is also formed on the side ...
Embodiment
[0129] Hereinafter, specific examples of the above-mentioned embodiment will be described.
[0130]
[0131] First, as a semiconductor substrate, a plurality of polycrystalline silicon substrates having a square shape with a side of about 156 mm and a thickness of about 200 μm in plan view were prepared. As these silicon substrates, a polysilicon substrate of p-type conductivity having a resistivity of about 1.5 Ω·cm by boron doping is used. The damaged layer on the surface of the silicon substrate was etched and cleaned with an aqueous NaOH solution.
[0132] Further, a concavo-convex structure (texture structure) was formed on the surface side of each silicon substrate by RIE (Reactive Ion Etching: Reactive Ion Etching) method.
[0133] Next, phosphorus oxychloride (POCl 3 ) The vapor phase thermal diffusion method used as a diffusion source diffuses phosphorus to form an n-type reverse conductivity layer having a sheet resistance of about 90Ω / □ on the surface of the sil...
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Abstract
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