One-dimensional tellurium micro-nano structure film with controllable wettability and preparation method thereof
A tellurium micro-nano structure film technology, applied in the field of four one-dimensional tellurium micro-nano structure films and their preparation, to achieve the effects of simple experimental equipment, fast water droplet diffusion speed, and simple steps
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Embodiment 1
[0043] (1) Place a FeCoCr alloy substrate with a length of 2.5 cm and a width of 2.5 cm in an ethanol solution, ultrasonicate for 5 minutes to remove surface organic matter, take it out and dry it with nitrogen;
[0044] (2) Put tellurium powder 1 with a purity of 99.99% in a boat-shaped crucible, and then place the boat-shaped crucible with tellurium powder 1 in the high-temperature center of the quartz tube of the tube furnace 2. The diameter of the quartz tube is 2.5 cm and the length is 1 m. ;
[0045] (3) placing the FeCoCr alloy substrate 3 cleaned in step (1) in the downstream low-temperature area along the airflow;
[0046] (4) Turn on the vacuum pump and pump the pressure inside the quartz tube to about 1pa;
[0047] (5) Open the hydrogen valve connected to the tube furnace, and use hydrogen with a gas flow rate of 10 sccm to continuously flush the quartz tube three times;
[0048] (6) Close the hydrogen valve and open the argon valve to ensure that the flow rate of...
Embodiment 2
[0057] The difference between this example and Example 1 is that in step (6), the flow rate of argon gas is kept at 120 sccm, and the pressure in the quartz tube is kept at 13800 pa; in step (11), the growth (deposition time) is kept at 45 minutes.
[0058] Also: (13) Place the FeCoCr alloy substrate modified by the randomly oriented needle-tip nanowire clusters described in step (10) in the central temperature zone of the tube furnace, vacuumize the tube furnace to 10 Pa before heating, and lower the furnace temperature to Raise the temperature to 250°C, pass in argon gas with a flow rate of 10 sccm, and keep the oxygen-free state in the tube for 0.5h to obtain a smooth tellurium film.
[0059] The morphological characterization of the one-dimensional tellurium micro-nano structure film and tellurium smooth thin film in Examples 1 and 2 of the present invention will be described below.
[0060] The invention uses a field emission scanning electron microscope S4800 to characte...
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Abstract
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